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Low-temperature plasma magnetron discharge
Published 2019-06-01“…The article investigates a low-temperature plasma of the magnetron discharge of a device used for the synthesis of dielectric films by reactive cathode sputtering. The aim of the study is to determine the temperature characteristics of plasma particles and a sputtered substance, as well as the mechanism for the formation of a chemical bond between sputtered atoms and active gas molecules. …”
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A Comprehensive Review of Plasma Cleaning Processes Used in Semiconductor Packaging
Published 2025-06-01“…Sputtering is therefore a physical process driven by momentum transfer. …”
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64
Solution-processed room temperature nickel oxide hole transport layer for perovskite solar cells
Published 2025-04-01“…The perovskite active layer can be processed by wet coating methods and thermal treatments at much lower temperatures. …”
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Enhancing the performance of Bi2O3–ZnO semiconductor bilayers for photoelectrochemical electrodes by strategically engineering oxygen vacancies
Published 2025-06-01“…ZnO was fabricated through sputtering at elevated substrate temperatures, which also facilitated the formation of oxygen vacancies. …”
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Zinc Oxide/Molybdenum Disulfide as Nanocomposite for Multifunctional Sensor Prototype
Published 2025-03-01“…After the ZnO was prepared on a silicon substrate by using DC sputtering at room temperature, molybdenum disulfide layers were spin-coated on a nanostructured zinc oxide flake-shaped surface to form an active layer. …”
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Self-Powered p-NiO/n-ZnO Heterojunction Ultraviolet Photodetector Based on Honeycomb Nano-Mesh Structure
Published 2024-12-01“…The nearly 10-fold increase in responsivity and detectivity of the detector with the introduction of the honeycomb structure under zero-bias conditions is attributed to the macroporous structure of the ZnO honeycomb nano-mesh, which increases the surface active sites and facilitates the enhancement of light trapping. …”
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Fabrication of Low-Emissivity Glass with Antibacterial Properties by Coating Cu/AZO Thin Films
Published 2024-09-01“…This study explores the feasibility of using Cu/AZO thin films as low-emissivity materials with antibacterial properties, fabricated using the linear sputtering method. The linear sputtering technique deposits thin films onto continuous substrates, offering high throughput, uniform coatings, and precise control over film properties. …”
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Template‐Free Synthesis of Highly Porous Metal Nitride Architectures for Electronics and Molecular Sensing
Published 2025-06-01“…When used as films in surface‐active applications, however, their performance remains limited by poor mass transfer and reduced accessibility of reactive sites. …”
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NANOSTRUCTURED CARBON MATERIALS IN EMISSION ELECTRONICS
Published 2017-06-01“…Diamond-like carbon films were obtained by using the methods of high-frequency magnetron sputtering, high-frequency diode discharge in a gas mixture of cyclohexane and hydrogen, graphite ion-beam sputtering. …”
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Development in Photoelectrochemical Water Splitting Using Carbon-Based Materials: A Path to Sustainable Hydrogen Production
Published 2025-03-01“…Various electrode synthesis techniques, including hydrothermal methods, chemical vapor deposition (CVD), pulsed laser deposition (PLD), and radio frequency sputtering (RF), are reviewed for their advantages and limitations. …”
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Improved Resistive Switching Characteristics by O<sub>2</sub> Plasma Treatment in Tri-Layer HfO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub>/HfO<sub>2</sub> RRAM
Published 2025-01-01“…In this study, a tri-layer HfO2/Al2O3/HfO2 (7/6/7 nm) structure was fabricated using a cost-effective RF sputtering process and treated with oxygen plasma to serve as the resistive switching (RS) active layer for RRAM devices. …”
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Impact of Reset Pulse Width on Gradual Conductance Programming in Al<sub>2</sub>O<sub>3</sub>/TiO<sub>x</sub>-Based RRAM
Published 2025-06-01“…A 32 × 32 cross-point array of Ti (12 nm)/Pt (62 nm)/Al<sub>2</sub>O<sub>3</sub> (3 nm)/TiO<sub>x</sub> (32 nm)/Ti (14 nm)/Pt (60 nm) devices (2.5 µm × 2.5 µm active area) was fabricated via e-beam evaporation, atomic layer deposition, and reactive sputtering. …”
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Influence of substrate bias on the properties of CrAlN wear-resistant coating prepared by arc/magnetron composite technology
Published 2025-02-01“…In addition, substrate bias, a key process parameter, was found to affect particle activity and sputtering yield, thereby modulating element distribution in the coating and coating properties. …”
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Corrosion behavior of NiCrAlY coatings under alternating salt spray and high temperature environment
Published 2024-12-01“…After 168 h exposure to alternating ambient salt spray and high temperature oxidation test,the Al2O3 scale formed on the coating is damaged owing to the chlorine induced active oxidation mechanism,eventually resulting in Cr2O3 scale formation. …”
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The plasma-chemical mechanism of surface destruction of the diagnostic system components inside EAST vacuum vessel
Published 2025-06-01“…The depths profiling analysis was performed using argon ion sputtering with an energy of 2 keV to a depth of 60 nm. …”
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Reactions of Metal Cluster Ions
Published 1988-12-01“… In order to prove their extraordinary behaviour as a function of size, metal cluster ions, generated by sputtering, were investigated by a variety of experiments. …”
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Optical CO2 Gas Sensing Based on TiO2 Thin Films of Diverse Thickness Decorated with Silver Nanoparticles
Published 2018-01-01“…The SEM micrographs confirmed the deposition of AgNPs on the TiO2 thin films. With increasing sputtering time, TiO2 films were found to be denser and more compact, indicating a reduced porosity and higher film thickness. …”
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Titanium Nitride as an Intermetallic Diffusion Barrier for Hydrogen Permeation in Palladium–Vanadium Composite Membranes
Published 2025-02-01“…The membranes were unstable at 500 °C, which was attributed to the instability of the thin Pd layer and loss of catalytic activity.…”
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Correlation of Photocatalysis and Photoluminescence Effect in Relation to the Surface Properties of TiO2:Tb Thin Films
Published 2013-01-01“…Thin films were prepared by high-energy reactive magnetron sputtering process, which enables obtaining highly nanocrystalline rutile structure of deposited films. …”
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