Showing 1 - 8 results of 8 for search 'Hafnium(IV) oxide', query time: 0.07s Refine Results
  1. 1
    Effect of Lanthanum‐Aluminum Co‐Doping on Structure of Hafnium Oxide Ferroelectric Crystals

    Effect of Lanthanum‐Aluminum Co‐Doping on Structure of Hafnium Oxide Ferroelectric Crystals by Zhenhai Li, Shuqi Tang, Tianyu Wang, Yongkai Liu, Jialin Meng, Jiajie Yu, Kangli Xu, Ruihong Yuan, Hao Zhu, Qingqing Sun, Shiyou Chen, David Wei Zhang, Lin Chen

    Published 2025-01-01
    “…Here, the influence of aluminum (Al) and lanthanum (La) co‐doping HfO2 thin films on the ferroelectric characteristics of hafnium‐based devices is investigated. Among devices with different La/Al ratios, the Al and La co‐doped hafnium oxide (HfAlAO) device with 4.2% Al and 2.17% La exhibited the excellent remanent polarization and thermostability. …”
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  2. 2
    Surface State Capture Cross-Section at the Interface between Silicon and Hafnium Oxide

    Surface State Capture Cross-Section at the Interface between Silicon and Hafnium Oxide by Fu-Chien Chiu

    Published 2013-01-01
    “…The interfacial properties between silicon and hafnium oxide (HfO2) are explored by the gated-diode method and the subthreshold measurement. …”
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  3. 3
    Microstructure and oxidation resistance of Pd+Zr and Pd+Hf co-doped aluminide coatings deposited on Mar-M247 nickel superalloy

    Microstructure and oxidation resistance of Pd+Zr and Pd+Hf co-doped aluminide coatings deposited on Mar-M247 nickel superalloy by Romanowska J., Zagula-Yavorska M.

    Published 2023-01-01
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  4. 4
    Ferroelectric memory: state-of-the-art manufacturing and research

    Ferroelectric memory: state-of-the-art manufacturing and research by D. A. Abdullaev, R. A. Milovanov, R. L. Volkov, N. I. Borgardt, A. N. Lantsev, K. A. Vorotilov, A. S. Sigov

    Published 2020-10-01
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  5. 5
    Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition

    Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition by Chi-Chieh Wang, Cheng-Fu Wang, Meng-Chi Li, Li-Chen Su, Chien-Cheng Kuo

    Published 2024-12-01
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  6. 6
    Engineering the Mechanics and Thermodynamics of Ti<sub>3</sub>AlC<sub>2</sub>, Hf<sub>3</sub>AlC<sub>2</sub>, Hf<sub>3</sub>GaC<sub>2</sub>, (ZrHf)<sub>3</sub>AlC<sub>2</sub>, and (ZrHf)<sub>4</sub>AlN<sub>3</sub> MAX Phases via the Ab Initio Method

    Engineering the Mechanics and Thermodynamics of Ti<sub>3</sub>AlC<sub>2</sub>, Hf<sub>3</sub>AlC<sub>2</sub>, Hf<sub>3</sub>GaC<sub>2</sub>, (ZrHf)<sub>3</sub>AlC<sub>2</sub>, and... by Adel Bandar Alruqi

    Published 2025-01-01
    “…This study investigated Ti<sub>3</sub>AlC<sub>2</sub> alloyed with nitrogen, gallium, hafnium, and zirconium with the aim of achieving better mechanical and thermal performances. …”
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  7. 7
    Effects of Gate Stack Structural and Process Defectivity on High-k Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs

    Effects of Gate Stack Structural and Process Defectivity on High-k Dielectric Dependence of NBTI Reliability in 32 nm Technology Node PMOSFETs by H. Hussin, N. Soin, M. F. Bukhori, S. Wan Muhamad Hatta, Y. Abdul Wahab

    Published 2014-01-01
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  8. 8
    Progress in the Sputtering Preparation of Hf0.5Zr0.5O2 Ferroelectric Films and Memories

    Progress in the Sputtering Preparation of Hf0.5Zr0.5O2 Ferroelectric Films and Memories by Kun Chen, Dan Zheng, Jie Gao, Hao Wang, Baoyuan Wang

    Published 2025-02-01
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