Ultra-fast etching of photoresist by reactive atmospheric-pressure thermal plasma jet with surface temperature measurement by Kyohei Matsumoto, Hibiki Kato, Jiawen Yu, Hiroaki Hanafusa, Seiichiro Higashi

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Instantaneous deposition-rate modulator for vacuum vapor deposition: fabrication of polarization gradated organic film by Sowon Kim, Masahiro Ohara, Hirohiko Fukagawa, Hisao Ishii

Subjects: “…organic film…”
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