APA (7th ed.) Citation

Telliera, C. R., Hodebourg, C., & Leblois, T. G. Some Investigations on the Anisotropy of the Chemical Etching of (h k 0) and (h h I) Silicon Plates in a NaOH 35% Solution. Part III: Determination of a Database for the Simulator Tensosim and Prediction of 2D Etching Shapes. Wiley.

Chicago Style (17th ed.) Citation

Telliera, C. R., C. Hodebourg, and T. G. Leblois. Some Investigations on the Anisotropy of the Chemical Etching Of (h k 0) and (h h I) Silicon Plates in a NaOH 35% Solution. Part III: Determination of a Database for the Simulator Tensosim and Prediction of 2D Etching Shapes. Wiley.

MLA (9th ed.) Citation

Telliera, C. R., et al. Some Investigations on the Anisotropy of the Chemical Etching Of (h k 0) and (h h I) Silicon Plates in a NaOH 35% Solution. Part III: Determination of a Database for the Simulator Tensosim and Prediction of 2D Etching Shapes. Wiley.