NITROGEN POTENTIAL DURING ION NITRIDING PROCESS IN GLOW-DISCHARGE PLASMA
The paper considers problems on regulation of phase composition of a nitrided layer during gas and ion nitriding process in a glow-discharge. It has been established that available models for control of nitrided layer structure with the help of nitriding index (nitrogen potential) can not be applie...
Saved in:
| Main Author: | A. A. Kozlov |
|---|---|
| Format: | Article |
| Language: | Russian |
| Published: |
Belarusian National Technical University
2015-03-01
|
| Series: | Наука и техника |
| Subjects: | |
| Online Access: | https://sat.bntu.by/jour/article/view/802 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
ENERGY PARAMETERS OF THE INDUSTRIAL INSTALLATION FOR ION NITRIDING
by: M. N. Bosjakov, et al.
Published: (2019-06-01) -
OPTICAL CHARACTERISTICS OF ALN THIN FILMS DEPOSITED BY DC MAGNETRON AND ION-BEAM SPUTTERING STUDY
by: M. V. Ermolenko, et al.
Published: (2019-06-01) -
Development and receiving nanostructural topokompozit
by: P. B. Grinberg, et al.
Published: (2017-08-01) -
GENERATION-RECOMBINATION PROCESSES IN DIRECT INTERMEDIATE BAND PHOTOVOLTAIC NANOHETEROSTRUCTURES
by: Sergei Chebotarev, et al.
Published: (2022-03-01) -
Electrochemical Properties of Nitrogen Doped Nanostructured Diamond Coatings Synthesized in the Plasma of Direct Current Glow Discharge
by: S.F. Dudnik, et al.
Published: (2015-06-01)