Enhancing polysulfone membranes with UiO-66-NH2@TiO2 for humic acid removal in a PMR under visible light
Abstract In this study, the composite photocatalyst UiO-66-NH₂@TiO₂ and a polysulfone membrane modified with it were evaluated for removing humic acid (HA) under visible light in a photocatalytic membrane reactor (PMR). The photocatalyst and membrane were analyzed using FTIR, XRD, FESEM, PL, DRS, AF...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2025-07-01
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| Series: | npj Clean Water |
| Online Access: | https://doi.org/10.1038/s41545-025-00498-8 |
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| Summary: | Abstract In this study, the composite photocatalyst UiO-66-NH₂@TiO₂ and a polysulfone membrane modified with it were evaluated for removing humic acid (HA) under visible light in a photocatalytic membrane reactor (PMR). The photocatalyst and membrane were analyzed using FTIR, XRD, FESEM, PL, DRS, AFM, BET, contact angle, and porosity tests to assess pollutant removal, water flux, and membrane resistance. Synthesis was confirmed by FTIR and XRD, while DRS showed a 2.87 eV bandgap, indicating visible light activity. PL results revealed reduced electron-hole recombination. FTIR and SEM confirmed photocatalyst presence and uniform dispersion in the membrane, improving hydrophilicity by decreasing the contact angle by 8°. In suspension, the photocatalyst removed 93% of HA under visible light. Among modified membranes, PS-UNT6% performed best, showing a 26% increase in pure water flux and 12% higher HA removal (total 95.2%) compared to the unmodified membrane. Fouling was significantly reduced, with only a 14% flux drop after 12 h under light, versus 19% without modification. Pore-blocking resistance decreased by over 98%, along with reductions in intrinsic, fouling, and cake resistances, demonstrating enhanced membrane performance through photocatalytic modification. |
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| ISSN: | 2059-7037 |