Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum Evaporation

The various thin film growth mechanisms during thermal vacuum evaporation at atomic level are considered under different condition. Which factors and how influence on the quality of obtained thin films was demonstrated. The thin film’s growth process in intermediately (Stranski-Krastanov) mode was s...

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Main Author: T. Su. Chu
Format: Article
Language:Russian
Published: Saint Petersburg Electrotechnical University "LETI" 2016-12-01
Series:Известия высших учебных заведений России: Радиоэлектроника
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Online Access:https://re.eltech.ru/jour/article/view/142
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author T. Su. Chu
author_facet T. Su. Chu
author_sort T. Su. Chu
collection DOAJ
description The various thin film growth mechanisms during thermal vacuum evaporation at atomic level are considered under different condition. Which factors and how influence on the quality of obtained thin films was demonstrated. The thin film’s growth process in intermediately (Stranski-Krastanov) mode was simulated based on Monte Carlo method for determination of active particles’ number, and quasi-Newtonian lattice method for determination of optimal direction of particles’ motion. On this model in any given conditions the fractal growth process was analyzed. The phenomenon (opportunity) of the control and management of the growth process of thin films was considered.
format Article
id doaj-art-f36969b5e8ea4f4bbc4e43df74cd6b7e
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publishDate 2016-12-01
publisher Saint Petersburg Electrotechnical University "LETI"
record_format Article
series Известия высших учебных заведений России: Радиоэлектроника
spelling doaj-art-f36969b5e8ea4f4bbc4e43df74cd6b7e2025-08-20T02:58:55ZrusSaint Petersburg Electrotechnical University "LETI"Известия высших учебных заведений России: Радиоэлектроника1993-89852658-47942016-12-01062231142Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum EvaporationT. Su. Chu0Saint-Petersburg Electrotechnical UniversityThe various thin film growth mechanisms during thermal vacuum evaporation at atomic level are considered under different condition. Which factors and how influence on the quality of obtained thin films was demonstrated. The thin film’s growth process in intermediately (Stranski-Krastanov) mode was simulated based on Monte Carlo method for determination of active particles’ number, and quasi-Newtonian lattice method for determination of optimal direction of particles’ motion. On this model in any given conditions the fractal growth process was analyzed. The phenomenon (opportunity) of the control and management of the growth process of thin films was considered.https://re.eltech.ru/jour/article/view/142computer simulationthin film’s growththermal vacuum evaporationmonte carlo methodlennard-jones potentialfractal structure
spellingShingle T. Su. Chu
Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum Evaporation
Известия высших учебных заведений России: Радиоэлектроника
computer simulation
thin film’s growth
thermal vacuum evaporation
monte carlo method
lennard-jones potential
fractal structure
title Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum Evaporation
title_full Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum Evaporation
title_fullStr Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum Evaporation
title_full_unstemmed Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum Evaporation
title_short Computer Simulation of the Thin Film’s Growth Process during Thermal Vacuum Evaporation
title_sort computer simulation of the thin film s growth process during thermal vacuum evaporation
topic computer simulation
thin film’s growth
thermal vacuum evaporation
monte carlo method
lennard-jones potential
fractal structure
url https://re.eltech.ru/jour/article/view/142
work_keys_str_mv AT tsuchu computersimulationofthethinfilmsgrowthprocessduringthermalvacuumevaporation