The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms
Thin films of titanium dioxide (TiO2) with several copper ratios were deposited on glass substrates using pulsed laser deposition (PLD) for pure and doped samples (TiO2 Pure, 1 % Cu, 2 % Cu, and 3 % Cu), energy (600 mJ), and frequency (6 Hz). X-ray diffraction (XRD) showed that the width of the pe...
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Tikrit University
2023-12-01
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| Series: | Tikrit Journal of Pure Science |
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| Online Access: | https://tjpsj.org/index.php/tjps/article/view/1377 |
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| author | Mohammad Adil Razooqi Zuheer Naji Majeed |
| author_facet | Mohammad Adil Razooqi Zuheer Naji Majeed |
| author_sort | Mohammad Adil Razooqi |
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Thin films of titanium dioxide (TiO2) with several copper ratios were deposited on glass substrates using pulsed laser deposition (PLD) for pure and doped samples (TiO2 Pure, 1 % Cu, 2 % Cu, and 3 % Cu), energy (600 mJ), and frequency (6 Hz). X-ray diffraction (XRD) showed that the width of the peaks decreases with increasing the ratio of doping with copper. This leads to an increase in the crystal size and in the intensity of the copper peaks, as well as a gradual decrease in the intensity of the titanium dioxide peaks. The results of the atomic force microscope showed that increasing the inoculation percentage leads to an increase in the surface roughness and the average grain diameter, and thus an increase in the growth of the particle size. The electrical tests (Hall effect) showed that the prepared films are of (n-type) and that the concentration of carriers (n) increased with the doping ratio, while the mobility values (µH) decreased directly with the increase in copper. The electrical conductivity (DC) test showed an increase in the activation energy as a result of the increase in the copper inoculation percentage and thus the electrical conductivity increases.
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| format | Article |
| id | doaj-art-eb3e1bb6edf8441cb63261dcbaeed0db |
| institution | OA Journals |
| issn | 1813-1662 2415-1726 |
| language | English |
| publishDate | 2023-12-01 |
| publisher | Tikrit University |
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| series | Tikrit Journal of Pure Science |
| spelling | doaj-art-eb3e1bb6edf8441cb63261dcbaeed0db2025-08-20T02:36:34ZengTikrit UniversityTikrit Journal of Pure Science1813-16622415-17262023-12-0128610.25130/tjps.v28i6.1377The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide NanofilmsMohammad Adil Razooqi0Zuheer Naji Majeed1Department of Physics, College of Education for Pure Sciences, University of Tikrit, Tikrit, IraqDepartment of Physics, College of Education for Pure Sciences, University of Tikrit, Tikrit, Iraq Thin films of titanium dioxide (TiO2) with several copper ratios were deposited on glass substrates using pulsed laser deposition (PLD) for pure and doped samples (TiO2 Pure, 1 % Cu, 2 % Cu, and 3 % Cu), energy (600 mJ), and frequency (6 Hz). X-ray diffraction (XRD) showed that the width of the peaks decreases with increasing the ratio of doping with copper. This leads to an increase in the crystal size and in the intensity of the copper peaks, as well as a gradual decrease in the intensity of the titanium dioxide peaks. The results of the atomic force microscope showed that increasing the inoculation percentage leads to an increase in the surface roughness and the average grain diameter, and thus an increase in the growth of the particle size. The electrical tests (Hall effect) showed that the prepared films are of (n-type) and that the concentration of carriers (n) increased with the doping ratio, while the mobility values (µH) decreased directly with the increase in copper. The electrical conductivity (DC) test showed an increase in the activation energy as a result of the increase in the copper inoculation percentage and thus the electrical conductivity increases. https://tjpsj.org/index.php/tjps/article/view/1377Titanium dioxidePLDXRDAFMHall effectElectrical conductivity. |
| spellingShingle | Mohammad Adil Razooqi Zuheer Naji Majeed The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms Tikrit Journal of Pure Science Titanium dioxide PLD XRD AFM Hall effect Electrical conductivity. |
| title | The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms |
| title_full | The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms |
| title_fullStr | The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms |
| title_full_unstemmed | The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms |
| title_short | The Effect of Copper Doping on Some Structural and Electrical Properties of Titanium Dioxide Nanofilms |
| title_sort | effect of copper doping on some structural and electrical properties of titanium dioxide nanofilms |
| topic | Titanium dioxide PLD XRD AFM Hall effect Electrical conductivity. |
| url | https://tjpsj.org/index.php/tjps/article/view/1377 |
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