Boron-doped diamond MOSFETs operating at temperatures up to 400°C
The boron-doped diamond (B-diamond) metal-oxide–semiconductor field–effect transistors (MOSFETs) are fabricated and characterized at operating temperatures up to 400°C. The SiO2 serves as the gate oxide insulator, while the Ti/Pt bilayer is employed as the gate contact metal. As the operating temper...
Saved in:
Main Authors: | Jiangwei Liu, Tokuyuki Teraji, Bo Da, Yasuo Koide |
---|---|
Format: | Article |
Language: | English |
Published: |
Taylor & Francis Group
2025-12-01
|
Series: | Functional Diamond |
Subjects: | |
Online Access: | http://dx.doi.org/10.1080/26941112.2025.2450513 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
TECHNIQUE OF ESTIMATE OF ABSORPTION COEFFICIENT LASER RADIATION IN BORON DOPED DIAMONDS BY INTENSITY OF RAMAN SCATTERING
by: O. N. Poklonskaya
Published: (2015-03-01) -
Electrochemical deposition of bimetallic sulfides on novel BDD electrode for bifunctional alkaline seawater electrolysis
by: Mingxu Li, et al.
Published: (2025-01-01) -
THE INFLUENCE OF MORPHOLOGY OF DIAMOND SYNTHETIC MICROPOWDER ON QUALITY OF PROCESSING OF THE CHANNEL OF CARBIDE DRAWING DIES
by: E. S. Eltsova, et al.
Published: (2017-10-01) -
Energy-dependent machining mechanism and process in water-jet guided laser processing single crystal diamond
by: Shilong Chen, et al.
Published: (2025-04-01) -
Properties of Aluminosilicate Refractories with Synthesized Boron-Modified TiO2 Nanocrystals
by: Claudia Carlucci, et al.
Published: (2015-03-01)