Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application

Te and Se layers were deposited on 〈glass/FTO/flat-TiO2〉 by electrochemical deposition. The Te-Se-stacked layer was annealed at 200°C, and then, the migration of Te into the Se layer by annealing was confirmed using auger electron spectroscopy (AES), which was performed by Te doping on the Se layer....

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Main Authors: Seigo Ito, Noriyuki Kitagawa, Takahiro Shibahara, Hitoshi Nishino
Format: Article
Language:English
Published: Wiley 2014-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2014/943538
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author Seigo Ito
Noriyuki Kitagawa
Takahiro Shibahara
Hitoshi Nishino
author_facet Seigo Ito
Noriyuki Kitagawa
Takahiro Shibahara
Hitoshi Nishino
author_sort Seigo Ito
collection DOAJ
description Te and Se layers were deposited on 〈glass/FTO/flat-TiO2〉 by electrochemical deposition. The Te-Se-stacked layer was annealed at 200°C, and then, the migration of Te into the Se layer by annealing was confirmed using auger electron spectroscopy (AES), which was performed by Te doping on the Se layer. Au back contact was coated by vacuum deposition on the Te-doped Se layer, resulting in superstrate-structured solar cells of 〈glass/FTO/flat-TiO2/Se-doped Te/Au〉 with a 0.50 V open-circuit voltage, 6.4 mA/cm2 photocurrent density, 0.36 fill factor, and 1.17% conversion efficiency.
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issn 1110-662X
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language English
publishDate 2014-01-01
publisher Wiley
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series International Journal of Photoenergy
spelling doaj-art-e7dcfa0c4e5a49e3befeff3241909dce2025-08-20T03:21:02ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2014-01-01201410.1155/2014/943538943538Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell ApplicationSeigo Ito0Noriyuki Kitagawa1Takahiro Shibahara2Hitoshi Nishino3Department of Electric Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Shosha 2167, Himeji, Hyogo 671-2280, JapanDepartment of Electric Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Shosha 2167, Himeji, Hyogo 671-2280, JapanDepartment of Electric Engineering and Computer Sciences, Graduate School of Engineering, University of Hyogo, Shosha 2167, Himeji, Hyogo 671-2280, JapanEnergy Technology Laboratories, Osaka Gas Co., Ltd., 6-19-9 Torishima, Konohana-Ku, Osaka 554-0051, JapanTe and Se layers were deposited on 〈glass/FTO/flat-TiO2〉 by electrochemical deposition. The Te-Se-stacked layer was annealed at 200°C, and then, the migration of Te into the Se layer by annealing was confirmed using auger electron spectroscopy (AES), which was performed by Te doping on the Se layer. Au back contact was coated by vacuum deposition on the Te-doped Se layer, resulting in superstrate-structured solar cells of 〈glass/FTO/flat-TiO2/Se-doped Te/Au〉 with a 0.50 V open-circuit voltage, 6.4 mA/cm2 photocurrent density, 0.36 fill factor, and 1.17% conversion efficiency.http://dx.doi.org/10.1155/2014/943538
spellingShingle Seigo Ito
Noriyuki Kitagawa
Takahiro Shibahara
Hitoshi Nishino
Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application
International Journal of Photoenergy
title Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application
title_full Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application
title_fullStr Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application
title_full_unstemmed Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application
title_short Electrochemical Deposition of Te and Se on Flat TiO2 for Solar Cell Application
title_sort electrochemical deposition of te and se on flat tio2 for solar cell application
url http://dx.doi.org/10.1155/2014/943538
work_keys_str_mv AT seigoito electrochemicaldepositionofteandseonflattio2forsolarcellapplication
AT noriyukikitagawa electrochemicaldepositionofteandseonflattio2forsolarcellapplication
AT takahiroshibahara electrochemicaldepositionofteandseonflattio2forsolarcellapplication
AT hitoshinishino electrochemicaldepositionofteandseonflattio2forsolarcellapplication