Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D Integration

Convergence of multiple functions in a single device is the main thought behind the development of the current electronic trends. So, the requirement for higher integration in electronic devices has become more important in present days than in the past. Through silicon via (TSV) is the latest inter...

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Main Authors: Zhaowen Yan, Ting Kang, Wei Zhang, Jianwei Wang
Format: Article
Language:English
Published: Wiley 2015-01-01
Series:International Journal of Antennas and Propagation
Online Access:http://dx.doi.org/10.1155/2015/470952
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author Zhaowen Yan
Ting Kang
Wei Zhang
Jianwei Wang
author_facet Zhaowen Yan
Ting Kang
Wei Zhang
Jianwei Wang
author_sort Zhaowen Yan
collection DOAJ
description Convergence of multiple functions in a single device is the main thought behind the development of the current electronic trends. So, the requirement for higher integration in electronic devices has become more important in present days than in the past. Through silicon via (TSV) is the latest interconnect technology proposed mainly for higher integration and higher frequency. Therefore, cross talk will be an essential issue that needs to be taken into consideration. In this paper, we study the electrical property of a GSSG (S-Signal, G-Ground) TSV structure and propose the accurate lumped model which can be used to predict the TSV performance. Since more dies are used within one chip, the single layer TSV cannot satisfy the requirement. Hence, we propose the multilayer TSV structure and study how the bump radius, bump height, and underfill material affect the TSV transmission performance and coupling issue, so that we can conduct a good TSV design. Furthermore, three multilayer 4 × 4 TSV array models are proposed with different GS distribution to analyze the detailed coupling results.
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institution DOAJ
issn 1687-5869
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publishDate 2015-01-01
publisher Wiley
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spelling doaj-art-e798d56becf547699e43877e54fdd45f2025-08-20T03:21:02ZengWileyInternational Journal of Antennas and Propagation1687-58691687-58772015-01-01201510.1155/2015/470952470952Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D IntegrationZhaowen Yan0Ting Kang1Wei Zhang2Jianwei Wang3School of Electronic and Information Engineering, Beihang University, No. 37 Xueyuan Road, Haidian District, Beijing 100191, ChinaSchool of Electronic and Information Engineering, Beihang University, No. 37 Xueyuan Road, Haidian District, Beijing 100191, ChinaSchool of Electronic and Information Engineering, Beihang University, No. 37 Xueyuan Road, Haidian District, Beijing 100191, ChinaSchool of Electronic and Information Engineering, Beihang University, No. 37 Xueyuan Road, Haidian District, Beijing 100191, ChinaConvergence of multiple functions in a single device is the main thought behind the development of the current electronic trends. So, the requirement for higher integration in electronic devices has become more important in present days than in the past. Through silicon via (TSV) is the latest interconnect technology proposed mainly for higher integration and higher frequency. Therefore, cross talk will be an essential issue that needs to be taken into consideration. In this paper, we study the electrical property of a GSSG (S-Signal, G-Ground) TSV structure and propose the accurate lumped model which can be used to predict the TSV performance. Since more dies are used within one chip, the single layer TSV cannot satisfy the requirement. Hence, we propose the multilayer TSV structure and study how the bump radius, bump height, and underfill material affect the TSV transmission performance and coupling issue, so that we can conduct a good TSV design. Furthermore, three multilayer 4 × 4 TSV array models are proposed with different GS distribution to analyze the detailed coupling results.http://dx.doi.org/10.1155/2015/470952
spellingShingle Zhaowen Yan
Ting Kang
Wei Zhang
Jianwei Wang
Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D Integration
International Journal of Antennas and Propagation
title Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D Integration
title_full Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D Integration
title_fullStr Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D Integration
title_full_unstemmed Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D Integration
title_short Modeling and Electromagnetic Analysis of Multilayer Through Silicon Via Interconnect for 3D Integration
title_sort modeling and electromagnetic analysis of multilayer through silicon via interconnect for 3d integration
url http://dx.doi.org/10.1155/2015/470952
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AT weizhang modelingandelectromagneticanalysisofmultilayerthroughsiliconviainterconnectfor3dintegration
AT jianweiwang modelingandelectromagneticanalysisofmultilayerthroughsiliconviainterconnectfor3dintegration