N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam Epitaxy

N-channel lnGaAs quantum well lasing thyristors (QWLT) based on regenerative loop of potential barrier lowering resulted from the forward biased pn junction is demonstrated in a AlGaAs/GaAs double heterostructure. Excellent electrical switching characteristics with a high voltage control efficiency...

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Main Author: H. C. Chen
Format: Article
Language:English
Published: Wiley 1998-01-01
Series:Active and Passive Electronic Components
Online Access:http://dx.doi.org/10.1155/1998/48934
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author H. C. Chen
author_facet H. C. Chen
author_sort H. C. Chen
collection DOAJ
description N-channel lnGaAs quantum well lasing thyristors (QWLT) based on regenerative loop of potential barrier lowering resulted from the forward biased pn junction is demonstrated in a AlGaAs/GaAs double heterostructure. Excellent electrical switching characteristics with a high voltage control efficiency ηv(=Vs/VH) of 6.7 have been obtained when the device is operated in the dark. Typical OFF- and ON-state resistances are 150KΩ and 10Ω respectively. A lasing threshold current density, front slope efficiency, and external differential quantum efficiency measured in as-cleaved device are 183A/cm2, 0.4mW/mA, and 31%, respectively. The peak emission wavelength is centered at about 980nm.
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spelling doaj-art-e5e89fa43cb240b0a69d9bdcf67884e72025-08-20T02:21:06ZengWileyActive and Passive Electronic Components0882-75161563-50311998-01-01212737810.1155/1998/48934N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam EpitaxyH. C. Chen0Department of Electrical Engineering, Far-East Junior College of Technology and Commerce, Tainan 744, TaiwanN-channel lnGaAs quantum well lasing thyristors (QWLT) based on regenerative loop of potential barrier lowering resulted from the forward biased pn junction is demonstrated in a AlGaAs/GaAs double heterostructure. Excellent electrical switching characteristics with a high voltage control efficiency ηv(=Vs/VH) of 6.7 have been obtained when the device is operated in the dark. Typical OFF- and ON-state resistances are 150KΩ and 10Ω respectively. A lasing threshold current density, front slope efficiency, and external differential quantum efficiency measured in as-cleaved device are 183A/cm2, 0.4mW/mA, and 31%, respectively. The peak emission wavelength is centered at about 980nm.http://dx.doi.org/10.1155/1998/48934
spellingShingle H. C. Chen
N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam Epitaxy
Active and Passive Electronic Components
title N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam Epitaxy
title_full N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam Epitaxy
title_fullStr N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam Epitaxy
title_full_unstemmed N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam Epitaxy
title_short N-Channel InGaAs Quantum Well Lasing Thyristor (QWLT) Prepared by Molecular Beam Epitaxy
title_sort n channel ingaas quantum well lasing thyristor qwlt prepared by molecular beam epitaxy
url http://dx.doi.org/10.1155/1998/48934
work_keys_str_mv AT hcchen nchannelingaasquantumwelllasingthyristorqwltpreparedbymolecularbeamepitaxy