Numerical Simulation of the Effect of Heater Position on the Oxygen Concentration in the CZ Silicon Crystal Growth Process
We perform numerical simulations to analyze the effect of the position of the heater on the thermal and flow fields and the oxygen concentration distribution during the industrial Cz silicon crystal growth process. The amount of oxygen released from the silica crucible to the silicon melt during the...
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| Main Authors: | Ying-Yang Teng, Jyh-Chen Chen, Chung-Wei Lu, Cheng-Chuan Huang, Wan-Ting Wun, Hsueh-I Chen, Chi-Yung Chen, Wen-Chieh Lan |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2012-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2012/395235 |
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