Features of Stress State of Germanium Nanocrystals in SiOx Matrix

Features of mechanical stress in germanium nanocrystals synthesised in amorphous SiОx matrix with SixNy buffer layer were studied by means of Fourier transform infrared absorption spectroscopy, Raman scattering and computer modeling. It was found that the germanium nanocrystals are under significant...

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Bibliographic Details
Main Authors: V.V. Kuryliuk, O.A. Korotchenkov, Z.F. Tsybrii, A.S. Nikolenko, V.V. Strelchuk
Format: Article
Language:English
Published: Sumy State University 2015-03-01
Series:Журнал нано- та електронної фізики
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Online Access:http://jnep.sumdu.edu.ua/download/numbers/2015/1/articles/jnep_2015_V7_01029.pdf
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Summary:Features of mechanical stress in germanium nanocrystals synthesised in amorphous SiОx matrix with SixNy buffer layer were studied by means of Fourier transform infrared absorption spectroscopy, Raman scattering and computer modeling. It was found that the germanium nanocrystals are under significant compressive stress with a magnitude of up to 2.9 GPa. Such a high strain value can be explained by a partial penetration of the nanocrystals in the silicon substrate. In this case the principal source of mechanical stress is the lattice mismatch between silicon and germanium.
ISSN:2077-6772