Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography
Highlights The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns. A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall em...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
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SpringerOpen
2025-04-01
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| Series: | Nano-Micro Letters |
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| Online Access: | https://doi.org/10.1007/s40820-025-01737-w |
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| _version_ | 1849235032788434944 |
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| author | Junlong Li Yanmin Guo Kun Wang Wei Huang Hao Su Wenhao Li Xiongtu Zhou Yongai Zhang Tailiang Guo Chaoxing Wu |
| author_facet | Junlong Li Yanmin Guo Kun Wang Wei Huang Hao Su Wenhao Li Xiongtu Zhou Yongai Zhang Tailiang Guo Chaoxing Wu |
| author_sort | Junlong Li |
| collection | DOAJ |
| description | Highlights The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns. A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission. The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting. |
| format | Article |
| id | doaj-art-e3ec2a013b5d4e3aa0fcb04a538ea33f |
| institution | Kabale University |
| issn | 2311-6706 2150-5551 |
| language | English |
| publishDate | 2025-04-01 |
| publisher | SpringerOpen |
| record_format | Article |
| series | Nano-Micro Letters |
| spelling | doaj-art-e3ec2a013b5d4e3aa0fcb04a538ea33f2025-08-20T04:02:55ZengSpringerOpenNano-Micro Letters2311-67062150-55512025-04-0117111410.1007/s40820-025-01737-wShadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV PhotolithographyJunlong Li0Yanmin Guo1Kun Wang2Wei Huang3Hao Su4Wenhao Li5Xiongtu Zhou6Yongai Zhang7Tailiang Guo8Chaoxing Wu9College of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityCollege of Physics and Information Engineering, Fuzhou UniversityHighlights The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns. A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall emission. The submicron light source fabricated by the shadow-assisted sidewall emission exhibits strong scalability and has been proved to be applicable in optical anti-counterfeiting.https://doi.org/10.1007/s40820-025-01737-wSubmicron light sourceQuantum dotPhotoluminescencePhotolithographyShadow-assisted sidewall emission |
| spellingShingle | Junlong Li Yanmin Guo Kun Wang Wei Huang Hao Su Wenhao Li Xiongtu Zhou Yongai Zhang Tailiang Guo Chaoxing Wu Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography Nano-Micro Letters Submicron light source Quantum dot Photoluminescence Photolithography Shadow-assisted sidewall emission |
| title | Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography |
| title_full | Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography |
| title_fullStr | Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography |
| title_full_unstemmed | Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography |
| title_short | Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography |
| title_sort | shadow assisted sidewall emission for achieving submicron linewidth light source by using normal uv photolithography |
| topic | Submicron light source Quantum dot Photoluminescence Photolithography Shadow-assisted sidewall emission |
| url | https://doi.org/10.1007/s40820-025-01737-w |
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