Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells

The subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125×125 mm2 were acid etched to produce simultaneously P...

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Main Authors: Yuang-Tung Cheng, Jyh-Jier Ho, William J. Lee, Song-Yeu Tsai, Yung-An Lu, Jia-Jhe Liou, Shun-Hsyung Chang, Kang L. Wang
Format: Article
Language:English
Published: Wiley 2010-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2010/268035
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author Yuang-Tung Cheng
Jyh-Jier Ho
William J. Lee
Song-Yeu Tsai
Yung-An Lu
Jia-Jhe Liou
Shun-Hsyung Chang
Kang L. Wang
author_facet Yuang-Tung Cheng
Jyh-Jier Ho
William J. Lee
Song-Yeu Tsai
Yung-An Lu
Jia-Jhe Liou
Shun-Hsyung Chang
Kang L. Wang
author_sort Yuang-Tung Cheng
collection DOAJ
description The subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125×125 mm2 were acid etched to produce simultaneously POCl3 emitters and silicon nitride deposition by plasma-enhanced chemical vapor deposited (PECVD). The study of surface morphology and reflectivity of different mc-Si etched surfaces has also been discussed in this research. Using our optimal acid etching solution ratio, we are able to fabricate mc-Si solar cells of 16.34% conversion efficiency with double layers silicon nitride (Si3N4) coating. From our experiment, we find that depositing double layers silicon nitride coating on mc-Si solar cells can get the optimal performance parameters. Open circuit (Voc) is 616 mV, short circuit current (Jsc) is 34.1 mA/cm2, and minority carrier diffusion length is 474.16 μm. The isotropic texturing and silicon nitride layers coating approach contribute to lowering cost and achieving high efficiency in mass production.
format Article
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institution Kabale University
issn 1110-662X
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language English
publishDate 2010-01-01
publisher Wiley
record_format Article
series International Journal of Photoenergy
spelling doaj-art-e35f395e148c4b8e980f32d1a73643f42025-02-03T01:09:53ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2010-01-01201010.1155/2010/268035268035Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar CellsYuang-Tung Cheng0Jyh-Jier Ho1William J. Lee2Song-Yeu Tsai3Yung-An Lu4Jia-Jhe Liou5Shun-Hsyung Chang6Kang L. Wang7Department of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanDepartment of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanPhotovoltaics Technology Center, Industrial Technology Research Institute, No. 195 Chung Hsing Rd., 4 Sec. Chu Tung, Hsin Chu 31061, TaiwanPhotovoltaics Technology Center, Industrial Technology Research Institute, No. 195 Chung Hsing Rd., 4 Sec. Chu Tung, Hsin Chu 31061, TaiwanDepartment of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanDepartment of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanDepartment of Microelectronic Engineering, National Kaohsiung Marine University, No. 142 Haijhuan Rd., Kaohsiung 81143, TaiwanDevice Research Laboratory, Department of Electrical Engineering, University of California, Los Angeles, CA 90095, USAThe subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125×125 mm2 were acid etched to produce simultaneously POCl3 emitters and silicon nitride deposition by plasma-enhanced chemical vapor deposited (PECVD). The study of surface morphology and reflectivity of different mc-Si etched surfaces has also been discussed in this research. Using our optimal acid etching solution ratio, we are able to fabricate mc-Si solar cells of 16.34% conversion efficiency with double layers silicon nitride (Si3N4) coating. From our experiment, we find that depositing double layers silicon nitride coating on mc-Si solar cells can get the optimal performance parameters. Open circuit (Voc) is 616 mV, short circuit current (Jsc) is 34.1 mA/cm2, and minority carrier diffusion length is 474.16 μm. The isotropic texturing and silicon nitride layers coating approach contribute to lowering cost and achieving high efficiency in mass production.http://dx.doi.org/10.1155/2010/268035
spellingShingle Yuang-Tung Cheng
Jyh-Jier Ho
William J. Lee
Song-Yeu Tsai
Yung-An Lu
Jia-Jhe Liou
Shun-Hsyung Chang
Kang L. Wang
Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells
International Journal of Photoenergy
title Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells
title_full Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells
title_fullStr Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells
title_full_unstemmed Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells
title_short Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells
title_sort investigation of low cost surface processing techniques for large size multicrystalline silicon solar cells
url http://dx.doi.org/10.1155/2010/268035
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