Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells
The subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125×125 mm2 were acid etched to produce simultaneously P...
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Format: | Article |
Language: | English |
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Wiley
2010-01-01
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Series: | International Journal of Photoenergy |
Online Access: | http://dx.doi.org/10.1155/2010/268035 |
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author | Yuang-Tung Cheng Jyh-Jier Ho William J. Lee Song-Yeu Tsai Yung-An Lu Jia-Jhe Liou Shun-Hsyung Chang Kang L. Wang |
author_facet | Yuang-Tung Cheng Jyh-Jier Ho William J. Lee Song-Yeu Tsai Yung-An Lu Jia-Jhe Liou Shun-Hsyung Chang Kang L. Wang |
author_sort | Yuang-Tung Cheng |
collection | DOAJ |
description | The subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125×125 mm2 were acid etched to produce simultaneously POCl3 emitters and silicon nitride deposition by plasma-enhanced chemical vapor deposited (PECVD). The study of surface morphology and reflectivity of different mc-Si etched surfaces has also been discussed in this research. Using our optimal acid etching solution ratio, we are able to fabricate mc-Si solar cells of 16.34% conversion efficiency with double layers silicon nitride (Si3N4) coating. From our experiment, we find that depositing double layers silicon nitride coating on mc-Si solar cells can get the optimal performance parameters. Open circuit (Voc) is 616 mV, short circuit current (Jsc) is 34.1 mA/cm2, and minority carrier diffusion length is 474.16 μm. The isotropic texturing and silicon nitride layers coating approach contribute to lowering cost and achieving high efficiency in mass production. |
format | Article |
id | doaj-art-e35f395e148c4b8e980f32d1a73643f4 |
institution | Kabale University |
issn | 1110-662X 1687-529X |
language | English |
publishDate | 2010-01-01 |
publisher | Wiley |
record_format | Article |
series | International Journal of Photoenergy |
spelling | doaj-art-e35f395e148c4b8e980f32d1a73643f42025-02-03T01:09:53ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2010-01-01201010.1155/2010/268035268035Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar CellsYuang-Tung Cheng0Jyh-Jier Ho1William J. Lee2Song-Yeu Tsai3Yung-An Lu4Jia-Jhe Liou5Shun-Hsyung Chang6Kang L. Wang7Department of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanDepartment of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanPhotovoltaics Technology Center, Industrial Technology Research Institute, No. 195 Chung Hsing Rd., 4 Sec. Chu Tung, Hsin Chu 31061, TaiwanPhotovoltaics Technology Center, Industrial Technology Research Institute, No. 195 Chung Hsing Rd., 4 Sec. Chu Tung, Hsin Chu 31061, TaiwanDepartment of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanDepartment of Electrical Engineering, National Taiwan Ocean University, No. 2 Pei-ning Rd., Keelung 20224, TaiwanDepartment of Microelectronic Engineering, National Kaohsiung Marine University, No. 142 Haijhuan Rd., Kaohsiung 81143, TaiwanDevice Research Laboratory, Department of Electrical Engineering, University of California, Los Angeles, CA 90095, USAThe subject of the present work is to develop a simple and effective method of enhancing conversion efficiency in large-size solar cells using multicrystalline silicon (mc-Si) wafer. In this work, industrial-type mc-Si solar cells with area of 125×125 mm2 were acid etched to produce simultaneously POCl3 emitters and silicon nitride deposition by plasma-enhanced chemical vapor deposited (PECVD). The study of surface morphology and reflectivity of different mc-Si etched surfaces has also been discussed in this research. Using our optimal acid etching solution ratio, we are able to fabricate mc-Si solar cells of 16.34% conversion efficiency with double layers silicon nitride (Si3N4) coating. From our experiment, we find that depositing double layers silicon nitride coating on mc-Si solar cells can get the optimal performance parameters. Open circuit (Voc) is 616 mV, short circuit current (Jsc) is 34.1 mA/cm2, and minority carrier diffusion length is 474.16 μm. The isotropic texturing and silicon nitride layers coating approach contribute to lowering cost and achieving high efficiency in mass production.http://dx.doi.org/10.1155/2010/268035 |
spellingShingle | Yuang-Tung Cheng Jyh-Jier Ho William J. Lee Song-Yeu Tsai Yung-An Lu Jia-Jhe Liou Shun-Hsyung Chang Kang L. Wang Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells International Journal of Photoenergy |
title | Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells |
title_full | Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells |
title_fullStr | Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells |
title_full_unstemmed | Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells |
title_short | Investigation of Low-Cost Surface Processing Techniques for Large-Size Multicrystalline Silicon Solar Cells |
title_sort | investigation of low cost surface processing techniques for large size multicrystalline silicon solar cells |
url | http://dx.doi.org/10.1155/2010/268035 |
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