Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches
Abstract Inverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions. The ILT leverages optimization algorithms to generate mask patterns, outperforming traditional optical proximity correction...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group
2025-07-01
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| Series: | Light: Science & Applications |
| Online Access: | https://doi.org/10.1038/s41377-025-01923-w |
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