Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate

In this paper, a p-pad-up InGaN-based flip-chip (FC) thin-film light-emitting diode (TFLED) on electroplating metallic substrate was fabricated by a combination of electrodes isolation, FC configuration, copper electroplating, and laser lift-off techniques. This allowed formation of n-contacts on Ga...

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Main Authors: Xiao-Long Hu, Zhao-Yi Qi, Hong Wang, Xi-Chun Zhang
Format: Article
Language:English
Published: IEEE 2016-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/7389483/
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author Xiao-Long Hu
Zhao-Yi Qi
Hong Wang
Xi-Chun Zhang
author_facet Xiao-Long Hu
Zhao-Yi Qi
Hong Wang
Xi-Chun Zhang
author_sort Xiao-Long Hu
collection DOAJ
description In this paper, a p-pad-up InGaN-based flip-chip (FC) thin-film light-emitting diode (TFLED) on electroplating metallic substrate was fabricated by a combination of electrodes isolation, FC configuration, copper electroplating, and laser lift-off techniques. This allowed formation of n-contacts on Ga-polar n-GaN and superior design of n-electrode pattern, resulting in an improved electrical performance when compared with the vertical-structure (VS) TFLED, in which the n-contacts need to be formed on N-polar n-GaN. In addition, the light output power was enhanced through this architecture due to the uniform current distribution and the absence of pads and wires on top of the FC-TFLEDs. It is found that the wall-plug efficiency of the FC-TFLEDs is 23.6% higher than that of the VS-TFLEDs. Moreover, the FC-TFLEDs with a concavely patterned surface were fabricated from the LED wafer with patterned sapphire substrate. Further improvement in output power was achieved when compared with that of the FC-TFLED fabricated from the LED wafer with flat sapphire substrate.
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institution Kabale University
issn 1943-0655
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publishDate 2016-01-01
publisher IEEE
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series IEEE Photonics Journal
spelling doaj-art-df9617129b0346b1b8f836b7e1d01f4e2025-08-20T03:32:55ZengIEEEIEEE Photonics Journal1943-06552016-01-01811810.1109/JPHOT.2016.25169117389483Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic SubstrateXiao-Long Hu0Zhao-Yi Qi1Hong Wang2Xi-Chun Zhang3Eng. Res. Center for Optoelectron. of Guangdong Province, South China Univ. of Technol., Guangzhou, ChinaEng. Res. Center for Optoelectron. of Guangdong Province, South China Univ. of Technol., Guangzhou, ChinaEng. Res. Center for Optoelectron. of Guangdong Province, South China Univ. of Technol., Guangzhou, ChinaEng. Res. Center for Optoelectron. of Guangdong Province, South China Univ. of Technol., Guangzhou, ChinaIn this paper, a p-pad-up InGaN-based flip-chip (FC) thin-film light-emitting diode (TFLED) on electroplating metallic substrate was fabricated by a combination of electrodes isolation, FC configuration, copper electroplating, and laser lift-off techniques. This allowed formation of n-contacts on Ga-polar n-GaN and superior design of n-electrode pattern, resulting in an improved electrical performance when compared with the vertical-structure (VS) TFLED, in which the n-contacts need to be formed on N-polar n-GaN. In addition, the light output power was enhanced through this architecture due to the uniform current distribution and the absence of pads and wires on top of the FC-TFLEDs. It is found that the wall-plug efficiency of the FC-TFLEDs is 23.6% higher than that of the VS-TFLEDs. Moreover, the FC-TFLEDs with a concavely patterned surface were fabricated from the LED wafer with patterned sapphire substrate. Further improvement in output power was achieved when compared with that of the FC-TFLED fabricated from the LED wafer with flat sapphire substrate.https://ieeexplore.ieee.org/document/7389483/InGaNflip-chipelectroplatingthin-film LEDsconcavely patterned surface
spellingShingle Xiao-Long Hu
Zhao-Yi Qi
Hong Wang
Xi-Chun Zhang
Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate
IEEE Photonics Journal
InGaN
flip-chip
electroplating
thin-film LEDs
concavely patterned surface
title Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate
title_full Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate
title_fullStr Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate
title_full_unstemmed Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate
title_short Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate
title_sort performance of ingan based thin film leds with flip chip configuration and concavely patterned surface fabricated on electroplating metallic substrate
topic InGaN
flip-chip
electroplating
thin-film LEDs
concavely patterned surface
url https://ieeexplore.ieee.org/document/7389483/
work_keys_str_mv AT xiaolonghu performanceofinganbasedthinfilmledswithflipchipconfigurationandconcavelypatternedsurfacefabricatedonelectroplatingmetallicsubstrate
AT zhaoyiqi performanceofinganbasedthinfilmledswithflipchipconfigurationandconcavelypatternedsurfacefabricatedonelectroplatingmetallicsubstrate
AT hongwang performanceofinganbasedthinfilmledswithflipchipconfigurationandconcavelypatternedsurfacefabricatedonelectroplatingmetallicsubstrate
AT xichunzhang performanceofinganbasedthinfilmledswithflipchipconfigurationandconcavelypatternedsurfacefabricatedonelectroplatingmetallicsubstrate