Conductive filament formation in the failure of Hf0.5Zr0.5O2 ferroelectric capacitors
Ferroelectric materials provide pathways to higher performance logic and memory technologies, with Hf0.5Zr0.5O2 being the most popular among them. However, critical challenges exist in understanding the material’s failure mechanisms to design long endurance lifetimes. In this work, dielectric failur...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-01-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/5.0248765 |
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| Summary: | Ferroelectric materials provide pathways to higher performance logic and memory technologies, with Hf0.5Zr0.5O2 being the most popular among them. However, critical challenges exist in understanding the material’s failure mechanisms to design long endurance lifetimes. In this work, dielectric failure due to repeated switching cycles, occurring through oxygen vacancy motion and leading to the formation of a conductive filament, is demonstrated. A field modified hopping barrier of ∼150–400 meV is observed, indicating a vacancy charge of 0.4–0.6e markedly different from the charge states predicted in the literature. After failure, the capacitor leakage current is high (∼25 mA) and constant with capacitor area, consistent with filament formation. Conductive atomic force microscopy measurements and field distribution simulations suggest a local failure mechanism consistent with filament formation along the boundary of the island capacitor due to an enhanced electric field. |
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| ISSN: | 2166-532X |