Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering

Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering

Nickel oxide (NiO) thin films were successfully deposited on Corning 7059 glass substrates at different oxygen partial pressures in the range of 1 × 10 – 4 to 9 × 10 – 4 mbar using dc reactive magnetron sputtering technique. Structural properties of NiO films showed polycrystalline nature with cubic...

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Bibliographic Details
Main Authors: Y. Ashok Kumar Reddy, A. Mallikarjuna Reddy, A. Sivasankar Reddy, P. Sreedhara Reddy
Format: Article
Language:English
Published: Sumy State University 2012-12-01
Series:Журнал нано- та електронної фізики
Subjects:
Sputtering
NiO thin films
Structural properties
Optical properties
Electrical properties
Oxygen partial pressur
Online Access:http://jnep.sumdu.edu.ua/download/numbers/2012/4/articles/jnep_2012_V4_04002.pdf
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