Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering
Nickel oxide (NiO) thin films were successfully deposited on Corning 7059 glass substrates at different oxygen partial pressures in the range of 1 × 10 – 4 to 9 × 10 – 4 mbar using dc reactive magnetron sputtering technique. Structural properties of NiO films showed polycrystalline nature with cubic...
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| Format: | Article |
| Language: | English |
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Sumy State University
2012-12-01
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| Series: | Журнал нано- та електронної фізики |
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| Online Access: | http://jnep.sumdu.edu.ua/download/numbers/2012/4/articles/jnep_2012_V4_04002.pdf |
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| author | Y. Ashok Kumar Reddy A. Mallikarjuna Reddy A. Sivasankar Reddy P. Sreedhara Reddy |
| author_facet | Y. Ashok Kumar Reddy A. Mallikarjuna Reddy A. Sivasankar Reddy P. Sreedhara Reddy |
| author_sort | Y. Ashok Kumar Reddy |
| collection | DOAJ |
| description | Nickel oxide (NiO) thin films were successfully deposited on Corning 7059 glass substrates at different oxygen partial pressures in the range of 1 × 10 – 4 to 9 × 10 – 4 mbar using dc reactive magnetron sputtering technique. Structural properties of NiO films showed polycrystalline nature with cubic structure along (220) orientation. The optical transmittance and band gap values of the films increased with increasing the oxygen partial pressure from 1 × 10 – 4 to 5 × 10 – 4 mbar and decreased on further increasing the oxygen partial pressure. Using Scanning Electron Microscopy (SEM), fine grains were observed at oxygen partial pressure of 5 × 10 – 4 mbar. The film resistivity decreases from 90.48 to 13.24 Ω cm with increase in oxygen partial pressure to 5 × 10 – 4 mbar and then increased on further increasing the oxygen partial pressure. |
| format | Article |
| id | doaj-art-de7e3695cf4d40c4943855be6fffc16d |
| institution | OA Journals |
| issn | 2077-6772 |
| language | English |
| publishDate | 2012-12-01 |
| publisher | Sumy State University |
| record_format | Article |
| series | Журнал нано- та електронної фізики |
| spelling | doaj-art-de7e3695cf4d40c4943855be6fffc16d2025-08-20T02:21:21ZengSumy State UniversityЖурнал нано- та електронної фізики2077-67722012-12-0144040021Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron SputteringY. Ashok Kumar ReddyA. Mallikarjuna ReddyA. Sivasankar ReddyP. Sreedhara ReddyNickel oxide (NiO) thin films were successfully deposited on Corning 7059 glass substrates at different oxygen partial pressures in the range of 1 × 10 – 4 to 9 × 10 – 4 mbar using dc reactive magnetron sputtering technique. Structural properties of NiO films showed polycrystalline nature with cubic structure along (220) orientation. The optical transmittance and band gap values of the films increased with increasing the oxygen partial pressure from 1 × 10 – 4 to 5 × 10 – 4 mbar and decreased on further increasing the oxygen partial pressure. Using Scanning Electron Microscopy (SEM), fine grains were observed at oxygen partial pressure of 5 × 10 – 4 mbar. The film resistivity decreases from 90.48 to 13.24 Ω cm with increase in oxygen partial pressure to 5 × 10 – 4 mbar and then increased on further increasing the oxygen partial pressure.http://jnep.sumdu.edu.ua/download/numbers/2012/4/articles/jnep_2012_V4_04002.pdfSputteringNiO thin filmsStructural propertiesOptical propertiesElectrical propertiesOxygen partial pressur |
| spellingShingle | Y. Ashok Kumar Reddy A. Mallikarjuna Reddy A. Sivasankar Reddy P. Sreedhara Reddy Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering Журнал нано- та електронної фізики Sputtering NiO thin films Structural properties Optical properties Electrical properties Oxygen partial pressur |
| title | Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering |
| title_full | Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering |
| title_fullStr | Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering |
| title_full_unstemmed | Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering |
| title_short | Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering |
| title_sort | preparation and characterization of nio thin films by dc reactive magnetron sputtering |
| topic | Sputtering NiO thin films Structural properties Optical properties Electrical properties Oxygen partial pressur |
| url | http://jnep.sumdu.edu.ua/download/numbers/2012/4/articles/jnep_2012_V4_04002.pdf |
| work_keys_str_mv | AT yashokkumarreddy preparationandcharacterizationofniothinfilmsbydcreactivemagnetronsputtering AT amallikarjunareddy preparationandcharacterizationofniothinfilmsbydcreactivemagnetronsputtering AT asivasankarreddy preparationandcharacterizationofniothinfilmsbydcreactivemagnetronsputtering AT psreedharareddy preparationandcharacterizationofniothinfilmsbydcreactivemagnetronsputtering |