Zinc Oxide Nanostructures by Oxidation of Zinc Films Deposited on Oxidized Silicon Substrate

In this work, we report the preparation and characterization of nanostructured ZnO film prepared by a novel technique of oxidation of zinc film. Zinc thin films of thicknesses 100, 200 and 500 nm were deposited on oxidized Si wafer by thermal evaporation technique. The as-deposited films were then a...

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Bibliographic Details
Main Authors: H.J. Pandya, S. Chandra
Format: Article
Language:English
Published: Sumy State University 2011-01-01
Series:Журнал нано- та електронної фізики
Subjects:
Online Access:http://jnep.sumdu.edu.ua/download/numbers/2011/1,%20Part%202/articles/jnep_2011_V3_N1(Part2)_409-413.pdf
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