Diffraction-Based Overlay Metrology With Optical Convolution Layer
Overlay is a crucial indicator of manufacturing processing between layers. Currently, diffraction-based overlay (DBO) is widely adopted in overlay metrology. In response to existing challenges in DBO metrology, this study applied the concept of optical computing to establish a DBO metrology with an...
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| Main Authors: | Jinyang Li, Hung-Fei Kuo |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2023-01-01
|
| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10323151/ |
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