Numerical Simulation-Based Study of Controlled Particle Deposition Technology for Wafer Surfaces
Scanning surface inspection systems (SSISs) require standard wafers (SWs) with traceable particle characteristics for accurate calibration. Achieving controlled particle deposition on wafer surfaces is essential for the fabrication of such SWs. In this study, numerical simulations were conducted usi...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-06-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2076-3417/15/13/6970 |
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