Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC Sputtering
Ag/C:H films were deposited by DC sputtering method on Si substrates with different Ar/CH4 gas mixture ratios. Effect of Ar/CH4 gas mixture ratios was investigated on optical and structural properties of Ag/C:H films by FTIR spectroscopy analysis, X-Ray diffractometry (XRD), scanning electron micros...
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| Format: | Article |
| Language: | English |
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Wiley
2013-01-01
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| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2013/142450 |
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| author | E. Mohsen Soltani Z. Ghorannevis M. Shirazi |
| author_facet | E. Mohsen Soltani Z. Ghorannevis M. Shirazi |
| author_sort | E. Mohsen Soltani |
| collection | DOAJ |
| description | Ag/C:H films were deposited by DC sputtering method on Si substrates with different Ar/CH4 gas mixture ratios. Effect of Ar/CH4 gas mixture ratios was investigated on optical and structural properties of Ag/C:H films by FTIR spectroscopy analysis, X-Ray diffractometry (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM), respectively. In order to evaluate the effect of gas flow ratio on the optical and structural properties of Ag/C:H films, Ar/CH4 gas ratio was changed by keeping the Ar flow rate constant while varying the CH4 gas flow rate (2, 5, and 10 SCCM). From FTIR analysis it was observed that increase in the Ar/CH4 gas ratio results in decreasing the sputtered Ag nanoparticles and increasing of C–H bonds. Also from XRD pattern it was found that intensity of Ag crystalline plane and average grain size decrease by adding CH4 to working gas admixture. From SEM and AFM micrographs, size of the grains also became smaller on the surface of the films, which will lead to decreasing the roughness of the deposited thin films. |
| format | Article |
| id | doaj-art-d82808ea7736440ab7e8f8f2e592fc29 |
| institution | Kabale University |
| issn | 1687-8434 1687-8442 |
| language | English |
| publishDate | 2013-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Advances in Materials Science and Engineering |
| spelling | doaj-art-d82808ea7736440ab7e8f8f2e592fc292025-02-03T06:14:15ZengWileyAdvances in Materials Science and Engineering1687-84341687-84422013-01-01201310.1155/2013/142450142450Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC SputteringE. Mohsen Soltani0Z. Ghorannevis1M. Shirazi2Department of Physics, North Tehran Branch, Islamic Azad University, Tehran 1667934783, IranDepartment of Physics, Islamic Azad University, Karaj 31485313, IranPlasma Physics Research Centre, Science and Research Branch, Islamic Azad University, Tehran 1477893855, IranAg/C:H films were deposited by DC sputtering method on Si substrates with different Ar/CH4 gas mixture ratios. Effect of Ar/CH4 gas mixture ratios was investigated on optical and structural properties of Ag/C:H films by FTIR spectroscopy analysis, X-Ray diffractometry (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM), respectively. In order to evaluate the effect of gas flow ratio on the optical and structural properties of Ag/C:H films, Ar/CH4 gas ratio was changed by keeping the Ar flow rate constant while varying the CH4 gas flow rate (2, 5, and 10 SCCM). From FTIR analysis it was observed that increase in the Ar/CH4 gas ratio results in decreasing the sputtered Ag nanoparticles and increasing of C–H bonds. Also from XRD pattern it was found that intensity of Ag crystalline plane and average grain size decrease by adding CH4 to working gas admixture. From SEM and AFM micrographs, size of the grains also became smaller on the surface of the films, which will lead to decreasing the roughness of the deposited thin films.http://dx.doi.org/10.1155/2013/142450 |
| spellingShingle | E. Mohsen Soltani Z. Ghorannevis M. Shirazi Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC Sputtering Advances in Materials Science and Engineering |
| title | Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC Sputtering |
| title_full | Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC Sputtering |
| title_fullStr | Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC Sputtering |
| title_full_unstemmed | Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC Sputtering |
| title_short | Effect of Ar/CH4 Mixture Ratio on Properties of Ag/C:H Nanocomposite Prepared by DC Sputtering |
| title_sort | effect of ar ch4 mixture ratio on properties of ag c h nanocomposite prepared by dc sputtering |
| url | http://dx.doi.org/10.1155/2013/142450 |
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