Etching Ceramic Samples with Fast Argon Atoms
A new approach to stripping surface layers from ceramics with fast atoms is proposed. The existing beam sources do not allow for a stripping rate of more than a few µm/h to be achieved. Usually, an increase in the etching rate is associated with growing flux density and energy of fast atoms, which c...
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MDPI AG
2025-01-01
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| Series: | Surfaces |
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| Online Access: | https://www.mdpi.com/2571-9637/8/1/4 |
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| author | Alexander S. Metel Sergey N. Grigoriev Marina A. Volosova Yury A. Melnik Enver S. Mustafaev |
| author_facet | Alexander S. Metel Sergey N. Grigoriev Marina A. Volosova Yury A. Melnik Enver S. Mustafaev |
| author_sort | Alexander S. Metel |
| collection | DOAJ |
| description | A new approach to stripping surface layers from ceramics with fast atoms is proposed. The existing beam sources do not allow for a stripping rate of more than a few µm/h to be achieved. Usually, an increase in the etching rate is associated with growing flux density and energy of fast atoms, which can heat the parts of the beam source up to an inadmissible temperature. In the present work, the etching rate was significantly increased at permanent flux density and energy due to an increase in the angle of incidence of fast atoms on the product surface. An increase in the angle of incidence from zero to 80° resulted not only in an increase in the etching rate by several times but also in simultaneous polishing of the surface to a high finishing class. |
| format | Article |
| id | doaj-art-d7ec6ed0ceab47a28d6893087a3f1304 |
| institution | Kabale University |
| issn | 2571-9637 |
| language | English |
| publishDate | 2025-01-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Surfaces |
| spelling | doaj-art-d7ec6ed0ceab47a28d6893087a3f13042025-08-20T03:43:40ZengMDPI AGSurfaces2571-96372025-01-0181410.3390/surfaces8010004Etching Ceramic Samples with Fast Argon AtomsAlexander S. Metel0Sergey N. Grigoriev1Marina A. Volosova2Yury A. Melnik3Enver S. Mustafaev4Department of High-Efficiency Processing Technologies, Moscow State University of Technology STANKIN, Vadkovskiy per. 3A, 127055 Moscow, RussiaDepartment of High-Efficiency Processing Technologies, Moscow State University of Technology STANKIN, Vadkovskiy per. 3A, 127055 Moscow, RussiaDepartment of High-Efficiency Processing Technologies, Moscow State University of Technology STANKIN, Vadkovskiy per. 3A, 127055 Moscow, RussiaDepartment of High-Efficiency Processing Technologies, Moscow State University of Technology STANKIN, Vadkovskiy per. 3A, 127055 Moscow, RussiaDepartment of High-Efficiency Processing Technologies, Moscow State University of Technology STANKIN, Vadkovskiy per. 3A, 127055 Moscow, RussiaA new approach to stripping surface layers from ceramics with fast atoms is proposed. The existing beam sources do not allow for a stripping rate of more than a few µm/h to be achieved. Usually, an increase in the etching rate is associated with growing flux density and energy of fast atoms, which can heat the parts of the beam source up to an inadmissible temperature. In the present work, the etching rate was significantly increased at permanent flux density and energy due to an increase in the angle of incidence of fast atoms on the product surface. An increase in the angle of incidence from zero to 80° resulted not only in an increase in the etching rate by several times but also in simultaneous polishing of the surface to a high finishing class.https://www.mdpi.com/2571-9637/8/1/4ceramicssurface layer removalsurface roughnessplasmaglow dischargeconcentrated beams |
| spellingShingle | Alexander S. Metel Sergey N. Grigoriev Marina A. Volosova Yury A. Melnik Enver S. Mustafaev Etching Ceramic Samples with Fast Argon Atoms Surfaces ceramics surface layer removal surface roughness plasma glow discharge concentrated beams |
| title | Etching Ceramic Samples with Fast Argon Atoms |
| title_full | Etching Ceramic Samples with Fast Argon Atoms |
| title_fullStr | Etching Ceramic Samples with Fast Argon Atoms |
| title_full_unstemmed | Etching Ceramic Samples with Fast Argon Atoms |
| title_short | Etching Ceramic Samples with Fast Argon Atoms |
| title_sort | etching ceramic samples with fast argon atoms |
| topic | ceramics surface layer removal surface roughness plasma glow discharge concentrated beams |
| url | https://www.mdpi.com/2571-9637/8/1/4 |
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