Lawrowski, R. D., Prommesberger, C., Langer, C., Dams, F., & Schreiner, R. Improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching. Wiley.
Chicago Style (17th ed.) CitationLawrowski, Robert Damian, Christian Prommesberger, Christoph Langer, Florian Dams, and Rupert Schreiner. Improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching. Wiley.
MLA (9th ed.) CitationLawrowski, Robert Damian, et al. Improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching. Wiley.
Warning: These citations may not always be 100% accurate.