Effect of Implantation Temperature on the Layer Exfoliation of H-implanted Germanium
This work describes the influence of implantation temperature on the layer exfoliation of the H-implanted Ge substrate. For the implantation at RT, post-implantation annealing showed large exfoliated regions over the sample surface. Two depths of the exfoliated regions were observed with average val...
Saved in:
| Main Authors: | U. Dadwal, Praveen Kumar, R. Singh |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Sumy State University
2013-05-01
|
| Series: | Журнал нано- та електронної фізики |
| Subjects: | |
| Online Access: | http://jnep.sumdu.edu.ua/download/numbers/2013/2/articles/jnep_2013_V5_02002.pdf |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Quantitative Criteria for Solvent Selection in Liquid-Phase Exfoliation: Balancing Exfoliation and Stabilization Efficiency
by: Shunnian Wu, et al.
Published: (2025-02-01) -
SILICON-GERMANIUM NANOSTRUCTURES WITH GERMANIUM QUANTUM DOTS FOR OPTOELECTRONIC APPLICATIONS
by: A. V. Mudryi, et al.
Published: (2015-04-01) -
Semiconductor Membrane Exfoliation: Technology and Application
by: Hongliang Chang, et al.
Published: (2025-01-01) -
Exfoliative dermatitis due to dermatophytosis
by: Risa Miliawati Nurul Hidayah, et al.
Published: (2021-03-01) -
Cryo‐Exfoliation Synthesis of Borophene and its Application in Wearable Electronics
by: Zhixuan Li, et al.
Published: (2025-07-01)