Selective Gelation Patterning of Solution-Processed Indium Zinc Oxide Films via Photochemical Treatments

Selective Gelation Patterning of Solution-Processed Indium Zinc Oxide Films via Photochemical Treatments

This study presents a photoresist-free patterning method for solution-processed indium zinc oxide (IZO) thin films using two photochemical exposure techniques, namely pulsed ultraviolet (UV) light and UV-ozone, and a plasma-based method using oxygen (O<sub>2</sub>) plasma. Pulsed UV ligh...

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Bibliographic Details
Main Authors: Seullee Lee, Taehui Kim, Ye-Won Lee, Sooyoung Bae, Seungbeen Kim, Min Woo Oh, Doojae Park, Youngjun Yun, Dongwook Kim, Jin-Hyuk Bae, Jaehoon Park
Format: Article
Language:English
Published: MDPI AG 2025-07-01
Series:Nanomaterials
Subjects:
patterning
solution-processed
indium zinc oxide
thin-film transistor
Online Access:https://www.mdpi.com/2079-4991/15/15/1147
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