Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography”
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-04-01
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| Series: | Advanced Materials Interfaces |
| Online Access: | https://doi.org/10.1002/admi.202400943 |
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| _version_ | 1849701473575763968 |
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| author | Eun‐Seok Choe Seungwook Choi Ansoon Kim Kwan‐Yong Kim Hee‐Jung Yeom Min Young Yoon Seongwan Hong Dong‐Wook Kim Jung‐Hyung Kim Hyo‐Chang Lee |
| author_facet | Eun‐Seok Choe Seungwook Choi Ansoon Kim Kwan‐Yong Kim Hee‐Jung Yeom Min Young Yoon Seongwan Hong Dong‐Wook Kim Jung‐Hyung Kim Hyo‐Chang Lee |
| author_sort | Eun‐Seok Choe |
| collection | DOAJ |
| format | Article |
| id | doaj-art-d4596fe209fb44f9b6fa5847f1863191 |
| institution | DOAJ |
| issn | 2196-7350 |
| language | English |
| publishDate | 2025-04-01 |
| publisher | Wiley-VCH |
| record_format | Article |
| series | Advanced Materials Interfaces |
| spelling | doaj-art-d4596fe209fb44f9b6fa5847f18631912025-08-20T03:17:55ZengWiley-VCHAdvanced Materials Interfaces2196-73502025-04-01127n/an/a10.1002/admi.202400943Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography”Eun‐Seok ChoeSeungwook ChoiAnsoon KimKwan‐Yong KimHee‐Jung YeomMin Young YoonSeongwan HongDong‐Wook KimJung‐Hyung KimHyo‐Chang Leehttps://doi.org/10.1002/admi.202400943 |
| spellingShingle | Eun‐Seok Choe Seungwook Choi Ansoon Kim Kwan‐Yong Kim Hee‐Jung Yeom Min Young Yoon Seongwan Hong Dong‐Wook Kim Jung‐Hyung Kim Hyo‐Chang Lee Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography” Advanced Materials Interfaces |
| title | Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography” |
| title_full | Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography” |
| title_fullStr | Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography” |
| title_full_unstemmed | Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography” |
| title_short | Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography” |
| title_sort | correction to evaluation of h2 plasma induced damage in materials for euv lithography |
| url | https://doi.org/10.1002/admi.202400943 |
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