Choe, E., Choi, S., Kim, A., Kim, K., Yeom, H., Yoon, M. Y., . . . Lee, H. Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography”. Wiley-VCH.
Chicago Style (17th ed.) CitationChoe, Eun‐Seok, et al. Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography”. Wiley-VCH.
MLA (9th ed.) CitationChoe, Eun‐Seok, et al. Correction to “Evaluation of H2 Plasma‐Induced Damage in Materials for EUV Lithography”. Wiley-VCH.
Warning: These citations may not always be 100% accurate.