Design and preparation of 222nm deep ultraviolet thin films
This paper proposes a design scheme for a deep ultraviolet anti-reflective film, with a substrate material of JGS1, and high and low refractive index materials of Al2O3 and AlF3, respectively. The Essential Macleod optical thin film design software was used to simulate the 222nm deep ultraviolet ant...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2025-01-01
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| Series: | E3S Web of Conferences |
| Online Access: | https://www.e3s-conferences.org/articles/e3sconf/pdf/2025/25/e3sconf_iceree2025_03006.pdf |
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