Progresses and Frontiers in Ultrawide Bandgap Semiconductors

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Bibliographic Details
Main Authors: Siddharth Rajan, Xiaohang Li
Format: Article
Language:English
Published: Wiley-VCH 2025-01-01
Series:Advanced Electronic Materials
Online Access:https://doi.org/10.1002/aelm.202400934
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author Siddharth Rajan
Xiaohang Li
author_facet Siddharth Rajan
Xiaohang Li
author_sort Siddharth Rajan
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institution Kabale University
issn 2199-160X
language English
publishDate 2025-01-01
publisher Wiley-VCH
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series Advanced Electronic Materials
spelling doaj-art-d2511db628124ffd9657170ec9f0a2842025-01-10T13:40:16ZengWiley-VCHAdvanced Electronic Materials2199-160X2025-01-01111n/an/a10.1002/aelm.202400934Progresses and Frontiers in Ultrawide Bandgap SemiconductorsSiddharth Rajan0Xiaohang Li1Department of Electrical and Computer Engineering The Ohio State University Columbus OH 43210 USAAdvanced Semiconductor Laboratory, Electrical and Computer Engineering Program CEMSE Division King Abdullah University of Science and Technology (KAUST) Thuwal 23955‐6900 Kingdom of Saudi Arabiahttps://doi.org/10.1002/aelm.202400934
spellingShingle Siddharth Rajan
Xiaohang Li
Progresses and Frontiers in Ultrawide Bandgap Semiconductors
Advanced Electronic Materials
title Progresses and Frontiers in Ultrawide Bandgap Semiconductors
title_full Progresses and Frontiers in Ultrawide Bandgap Semiconductors
title_fullStr Progresses and Frontiers in Ultrawide Bandgap Semiconductors
title_full_unstemmed Progresses and Frontiers in Ultrawide Bandgap Semiconductors
title_short Progresses and Frontiers in Ultrawide Bandgap Semiconductors
title_sort progresses and frontiers in ultrawide bandgap semiconductors
url https://doi.org/10.1002/aelm.202400934
work_keys_str_mv AT siddharthrajan progressesandfrontiersinultrawidebandgapsemiconductors
AT xiaohangli progressesandfrontiersinultrawidebandgapsemiconductors