Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes
In this paper a study of the anisotropic dissolution of (hk0) and (hhl) silicon plates in a NaOH 35% solution is undertaken. Effects of orientation on firstly, the geometrical features of etched surfaces and secondly, on the cross-sectional shape of starting circular plates are systematically invest...
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| Format: | Article |
| Language: | English |
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Wiley
2001-01-01
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| Series: | Active and Passive Electronic Components |
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| Online Access: | http://dx.doi.org/10.1155/2001/80453 |
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| author | C. A. Hodebourg C. R. Tellier |
| author_facet | C. A. Hodebourg C. R. Tellier |
| author_sort | C. A. Hodebourg |
| collection | DOAJ |
| description | In this paper a study of the anisotropic dissolution of (hk0) and (hhl) silicon plates in
a NaOH 35% solution is undertaken. Effects of orientation on firstly, the geometrical
features of etched surfaces and secondly, on the cross-sectional shape of starting circular
plates are systematically investigated. Conclusions of practical interest on the roughness
of etched (hk0) and (hhl) planes are drawn. 2D etching shapes are then analysed in terms
of the tensorial model for the anisotropic dissolution and of dissolution criteria. Finally
a comparative analysis of results related on the one hand, to 2D surface profiles and
on the other, to out-of-roundness profiles is made. This comparison shows that shapes
observed for profilometry traces agree with theoretical shapes as derived when we use
the resemblance in shapes between out-of-roundness profiles and polar diagrams of the
dissolution slowness. |
| format | Article |
| id | doaj-art-cfc4ace4dc05484fb17897d2329cbdba |
| institution | Kabale University |
| issn | 0882-7516 1563-5031 |
| language | English |
| publishDate | 2001-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Active and Passive Electronic Components |
| spelling | doaj-art-cfc4ace4dc05484fb17897d2329cbdba2025-02-03T01:21:15ZengWileyActive and Passive Electronic Components0882-75161563-50312001-01-01241315610.1155/2001/80453Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching ShapesC. A. Hodebourg0C. R. Tellier1Laboratoire de Chronométrie Electronique et Piezoélectricité, Ecole Nationale Supérieure de Mécanique et des Microtechniques, 26 chemin de l'Epitaphe, Besançon cédex 25030, Francelnstitut des Microtechniques de Franche-Comté, Avenue de l'Observatoire, Besançon cédex 25030, FranceIn this paper a study of the anisotropic dissolution of (hk0) and (hhl) silicon plates in a NaOH 35% solution is undertaken. Effects of orientation on firstly, the geometrical features of etched surfaces and secondly, on the cross-sectional shape of starting circular plates are systematically investigated. Conclusions of practical interest on the roughness of etched (hk0) and (hhl) planes are drawn. 2D etching shapes are then analysed in terms of the tensorial model for the anisotropic dissolution and of dissolution criteria. Finally a comparative analysis of results related on the one hand, to 2D surface profiles and on the other, to out-of-roundness profiles is made. This comparison shows that shapes observed for profilometry traces agree with theoretical shapes as derived when we use the resemblance in shapes between out-of-roundness profiles and polar diagrams of the dissolution slowness.http://dx.doi.org/10.1155/2001/80453Anisotropic etchingSiliconNaOH etchant. |
| spellingShingle | C. A. Hodebourg C. R. Tellier Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes Active and Passive Electronic Components Anisotropic etching Silicon NaOH etchant. |
| title | Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes |
| title_full | Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes |
| title_fullStr | Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes |
| title_full_unstemmed | Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes |
| title_short | Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes |
| title_sort | some investigations on the anisotropy of the chemical etching of hk0 and hhl silicon plates in a naoh 35 solution part i 2d etching shapes |
| topic | Anisotropic etching Silicon NaOH etchant. |
| url | http://dx.doi.org/10.1155/2001/80453 |
| work_keys_str_mv | AT cahodebourg someinvestigationsontheanisotropyofthechemicaletchingofhk0andhhlsiliconplatesinanaoh35solutionparti2detchingshapes AT crtellier someinvestigationsontheanisotropyofthechemicaletchingofhk0andhhlsiliconplatesinanaoh35solutionparti2detchingshapes |