Development platform for UV-NIL processes using polymer masters produced by laser ablation and photolithography
Ultraviolet nanoimprint lithography (UV-NIL) is a versatile and cost-effective technique for the fabrication of micro- and nanostructures by copying master patterns in a planar or a roll-to-roll process through curing of a liquid UV-sensitive precursor. For applications with a high pattern complexit...
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| Main Authors: | Joachim Zajadacz, Pierre Lorenz, Martin Ehrhardt, Klaus Zimmer |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-06-01
|
| Series: | Nanotechnology and Precision Engineering |
| Online Access: | http://dx.doi.org/10.1063/10.0034395 |
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