Two-photon absorption under few-photon irradiation for optical nanoprinting
Abstract Two-photon absorption (TPA) has been widely applied for three-dimensional imaging and nanoprinting; however, the efficiency of TPA imaging and nanoprinting using laser scanning techniques is limited by its trade-off to reach high resolution. Here, we unveil a concept, few-photon irradiated...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2025-03-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-025-57390-9 |
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| Summary: | Abstract Two-photon absorption (TPA) has been widely applied for three-dimensional imaging and nanoprinting; however, the efficiency of TPA imaging and nanoprinting using laser scanning techniques is limited by its trade-off to reach high resolution. Here, we unveil a concept, few-photon irradiated TPA, supported by a spatiotemporal model based on the principle of wave-particle duality of light. This model describes the precise time-dependent mechanism of TPA under ultralow photon irradiance with a single tightly focused femtosecond laser pulse. We demonstrate that a feature size of 26 nm (1/20 λ) and a pattern period of 0.41 λ with a laser wavelength of 517 nm can be achieved by performing digital optical projection nanolithography under few-photon irradiation using the in-situ multiple exposure technique, improving printing efficiency by 5 orders of magnitude. We show deeper insights into the TPA mechanism and encourage the exploration of potential applications for TPA in nanoprinting and nanoimaging. |
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| ISSN: | 2041-1723 |