Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer

Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer

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Bibliographic Details
Main Authors:	Chang Eon Kim, Jae Won Shim, Seok Jun Ham, Seung Hyun Kim
Format:	Article
Language:	English
Published:	American Chemical Society 2025-02-01
Series:	ACS Omega
Online Access:	https://doi.org/10.1021/acsomega.4c10935
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