Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer

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Bibliographic Details
Main Authors: Chang Eon Kim, Jae Won Shim, Seok Jun Ham, Seung Hyun Kim
Format: Article
Language:English
Published: American Chemical Society 2025-02-01
Series:ACS Omega
Online Access:https://doi.org/10.1021/acsomega.4c10935
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_version_ 1850233075548553216
author Chang Eon Kim
Jae Won Shim
Seok Jun Ham
Seung Hyun Kim
author_facet Chang Eon Kim
Jae Won Shim
Seok Jun Ham
Seung Hyun Kim
author_sort Chang Eon Kim
collection DOAJ
format Article
id doaj-art-c615e317ff064c6480972ff7898eb2e2
institution OA Journals
issn 2470-1343
language English
publishDate 2025-02-01
publisher American Chemical Society
record_format Article
series ACS Omega
spelling doaj-art-c615e317ff064c6480972ff7898eb2e22025-08-20T02:03:00ZengAmerican Chemical SocietyACS Omega2470-13432025-02-011088579858710.1021/acsomega.4c10935Utilizing Block Copolymer Films as an Etch Mask for Pattern TransferChang Eon KimJae Won ShimSeok Jun HamSeung Hyun Kimhttps://doi.org/10.1021/acsomega.4c10935
spellingShingle Chang Eon Kim
Jae Won Shim
Seok Jun Ham
Seung Hyun Kim
Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer
ACS Omega
title Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer
title_full Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer
title_fullStr Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer
title_full_unstemmed Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer
title_short Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer
title_sort utilizing block copolymer films as an etch mask for pattern transfer
url https://doi.org/10.1021/acsomega.4c10935
work_keys_str_mv AT changeonkim utilizingblockcopolymerfilmsasanetchmaskforpatterntransfer
AT jaewonshim utilizingblockcopolymerfilmsasanetchmaskforpatterntransfer
AT seokjunham utilizingblockcopolymerfilmsasanetchmaskforpatterntransfer
AT seunghyunkim utilizingblockcopolymerfilmsasanetchmaskforpatterntransfer