APA (7th ed.) Citation

Kim, C. E., Shim, J. W., Ham, S. J., & Kim, S. H. Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer. American Chemical Society.

Chicago Style (17th ed.) Citation

Kim, Chang Eon, Jae Won Shim, Seok Jun Ham, and Seung Hyun Kim. Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer. American Chemical Society.

MLA (9th ed.) Citation

Kim, Chang Eon, et al. Utilizing Block Copolymer Films as an Etch Mask for Pattern Transfer. American Chemical Society.