Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI Passivation

Abstract Monolayer molybdenum disulphide (MoS2) holds great potential for optoelectronic and photovoltaic applications, yet its performance is limited by intrinsic defects, such as sulfur vacancies, that hinder photoluminescence (PL) and charge carrier dynamics. This study investigates the effects o...

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Main Authors: Ary Anggara Wibowo, Anh Dinh Bui, Zhehao Sun, Li‐chun Chang, Zongyou Yin, Yuerui Lu, Daniel Macdonald, Hieu Trong Nguyen
Format: Article
Language:English
Published: Wiley-VCH 2025-06-01
Series:Advanced Materials Interfaces
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Online Access:https://doi.org/10.1002/admi.202500059
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_version_ 1849424631078846464
author Ary Anggara Wibowo
Anh Dinh Bui
Zhehao Sun
Li‐chun Chang
Zongyou Yin
Yuerui Lu
Daniel Macdonald
Hieu Trong Nguyen
author_facet Ary Anggara Wibowo
Anh Dinh Bui
Zhehao Sun
Li‐chun Chang
Zongyou Yin
Yuerui Lu
Daniel Macdonald
Hieu Trong Nguyen
author_sort Ary Anggara Wibowo
collection DOAJ
description Abstract Monolayer molybdenum disulphide (MoS2) holds great potential for optoelectronic and photovoltaic applications, yet its performance is limited by intrinsic defects, such as sulfur vacancies, that hinder photoluminescence (PL) and charge carrier dynamics. This study investigates the effects of passivation using cation‐based bis(trifluoromethanesulfonimide) (TFSI) treatments (Li‐TFSI, Cs‐TFSI, and Rb‐TFSI) on the optoelectronic properties of MoS2 monolayers. Implied open‐circuit voltages (iVoc) at 1 sun illumination are taken from photoluminescence measurements, yielding post‐treatment values of 1425, 1351, and 1381 mV for Li‐TFSI, Rb‐TFSI, and Cs‐TFSI, respectively, indicating reduced non‐radiative recombination. Optical absorption also increased after the cation‐based TFSI treatment, leading to expected improvements in short‐circuit current densities (JSC). These results demonstrate that cations can play an important role in reducing defect‐related recombination and improving charge carrier dynamics, and that cation‐based TFSI passivation may help to enhance the efficiency of MoS2‐based optoelectronic devices.
format Article
id doaj-art-c41e24012d82439fba9dddbc49d2f555
institution Kabale University
issn 2196-7350
language English
publishDate 2025-06-01
publisher Wiley-VCH
record_format Article
series Advanced Materials Interfaces
spelling doaj-art-c41e24012d82439fba9dddbc49d2f5552025-08-20T03:30:04ZengWiley-VCHAdvanced Materials Interfaces2196-73502025-06-011212n/an/a10.1002/admi.202500059Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI PassivationAry Anggara Wibowo0Anh Dinh Bui1Zhehao Sun2Li‐chun Chang3Zongyou Yin4Yuerui Lu5Daniel Macdonald6Hieu Trong Nguyen7School of Engineering Australian National University Acton 2601 AustraliaSchool of Engineering Australian National University Acton 2601 AustraliaResearch School of Chemistry Australian National University Acton 2601 AustraliaSchool of Engineering Australian National University Acton 2601 AustraliaResearch School of Chemistry Australian National University Acton 2601 AustraliaSchool of Engineering Australian National University Acton 2601 AustraliaSchool of Engineering Australian National University Acton 2601 AustraliaSchool of Engineering Australian National University Acton 2601 AustraliaAbstract Monolayer molybdenum disulphide (MoS2) holds great potential for optoelectronic and photovoltaic applications, yet its performance is limited by intrinsic defects, such as sulfur vacancies, that hinder photoluminescence (PL) and charge carrier dynamics. This study investigates the effects of passivation using cation‐based bis(trifluoromethanesulfonimide) (TFSI) treatments (Li‐TFSI, Cs‐TFSI, and Rb‐TFSI) on the optoelectronic properties of MoS2 monolayers. Implied open‐circuit voltages (iVoc) at 1 sun illumination are taken from photoluminescence measurements, yielding post‐treatment values of 1425, 1351, and 1381 mV for Li‐TFSI, Rb‐TFSI, and Cs‐TFSI, respectively, indicating reduced non‐radiative recombination. Optical absorption also increased after the cation‐based TFSI treatment, leading to expected improvements in short‐circuit current densities (JSC). These results demonstrate that cations can play an important role in reducing defect‐related recombination and improving charge carrier dynamics, and that cation‐based TFSI passivation may help to enhance the efficiency of MoS2‐based optoelectronic devices.https://doi.org/10.1002/admi.202500059cationsiVOCJSCMoS2passivation
spellingShingle Ary Anggara Wibowo
Anh Dinh Bui
Zhehao Sun
Li‐chun Chang
Zongyou Yin
Yuerui Lu
Daniel Macdonald
Hieu Trong Nguyen
Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI Passivation
Advanced Materials Interfaces
cations
iVOC
JSC
MoS2
passivation
title Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI Passivation
title_full Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI Passivation
title_fullStr Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI Passivation
title_full_unstemmed Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI Passivation
title_short Enhanced Implied Open Circuit Voltage of MoS2 via Cation‐based TFSI Passivation
title_sort enhanced implied open circuit voltage of mos2 via cation based tfsi passivation
topic cations
iVOC
JSC
MoS2
passivation
url https://doi.org/10.1002/admi.202500059
work_keys_str_mv AT aryanggarawibowo enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation
AT anhdinhbui enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation
AT zhehaosun enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation
AT lichunchang enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation
AT zongyouyin enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation
AT yueruilu enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation
AT danielmacdonald enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation
AT hieutrongnguyen enhancedimpliedopencircuitvoltageofmos2viacationbasedtfsipassivation