Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography Devices
Masked Stereolithography (mSLA) is an additive manufacturing technique that has been recently explored. Currently, studies in the literature addressing the investigation of stress concentrators in photosensitive resin parts printed on mSLA devices using the Whitney–Nuismer analytical method combined...
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| Format: | Article |
| Language: | English |
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MDPI AG
2025-03-01
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| Series: | Applied Mechanics |
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| Online Access: | https://www.mdpi.com/2673-3161/6/1/21 |
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| author | Carla Carvalho Pinto Fernando de Azevedo Silva Erick Siqueira Guidi |
| author_facet | Carla Carvalho Pinto Fernando de Azevedo Silva Erick Siqueira Guidi |
| author_sort | Carla Carvalho Pinto |
| collection | DOAJ |
| description | Masked Stereolithography (mSLA) is an additive manufacturing technique that has been recently explored. Currently, studies in the literature addressing the investigation of stress concentrators in photosensitive resin parts printed on mSLA devices using the Whitney–Nuismer analytical method combined with Finite Element Analysis (FEA) and Digital Image Correlation (DIC) are rare. This work utilizes the combination of these techniques to analyze stress concentrators in specimens subjected to axial and eccentric loads, considering the effects imposed by the clamp restraint and a complementary study considering the free loading condition. For axial loading, the results are consistent, with variations in the stress concentration factor ranging from 0.42% to 5.25%. For the eccentric loading studies, the results indicate that the most suitable method for the test was the analysis considering the restraint imposed by the clamp, as the deformation results show a maximum error of 6.9% compared to 24.7% when the restraints were disregarded. The consistency of the results reinforces the quality of the employed technique, demonstrating that this study not only achieved its objectives but also provided a foundation for future investigations in the field. |
| format | Article |
| id | doaj-art-c39d5f4bc82542efa69d18f376d7aabf |
| institution | OA Journals |
| issn | 2673-3161 |
| language | English |
| publishDate | 2025-03-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Applied Mechanics |
| spelling | doaj-art-c39d5f4bc82542efa69d18f376d7aabf2025-08-20T02:11:08ZengMDPI AGApplied Mechanics2673-31612025-03-01612110.3390/applmech6010021Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography DevicesCarla Carvalho Pinto0Fernando de Azevedo Silva1Erick Siqueira Guidi2Faculdade de Engenharia e Ciências, Campus Guaratinguetá, Av, Universidade Estadual Paulista “Julio de Mesquita Fillho”, Ariberto Pereira da Cunha, 333—Portal das Colinas—Guaratinguetá, São Paulo 12516-410, BrazilFaculdade de Engenharia e Ciências, Campus Guaratinguetá, Av, Universidade Estadual Paulista “Julio de Mesquita Fillho”, Ariberto Pereira da Cunha, 333—Portal das Colinas—Guaratinguetá, São Paulo 12516-410, BrazilFaculdade de Engenharia e Ciências, Campus Guaratinguetá, Av, Universidade Estadual Paulista “Julio de Mesquita Fillho”, Ariberto Pereira da Cunha, 333—Portal das Colinas—Guaratinguetá, São Paulo 12516-410, BrazilMasked Stereolithography (mSLA) is an additive manufacturing technique that has been recently explored. Currently, studies in the literature addressing the investigation of stress concentrators in photosensitive resin parts printed on mSLA devices using the Whitney–Nuismer analytical method combined with Finite Element Analysis (FEA) and Digital Image Correlation (DIC) are rare. This work utilizes the combination of these techniques to analyze stress concentrators in specimens subjected to axial and eccentric loads, considering the effects imposed by the clamp restraint and a complementary study considering the free loading condition. For axial loading, the results are consistent, with variations in the stress concentration factor ranging from 0.42% to 5.25%. For the eccentric loading studies, the results indicate that the most suitable method for the test was the analysis considering the restraint imposed by the clamp, as the deformation results show a maximum error of 6.9% compared to 24.7% when the restraints were disregarded. The consistency of the results reinforces the quality of the employed technique, demonstrating that this study not only achieved its objectives but also provided a foundation for future investigations in the field.https://www.mdpi.com/2673-3161/6/1/21Masked Stereolithography (mSLA)additive manufacturingstress concentratorsphotosensitive resinDIC |
| spellingShingle | Carla Carvalho Pinto Fernando de Azevedo Silva Erick Siqueira Guidi Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography Devices Applied Mechanics Masked Stereolithography (mSLA) additive manufacturing stress concentrators photosensitive resin DIC |
| title | Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography Devices |
| title_full | Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography Devices |
| title_fullStr | Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography Devices |
| title_full_unstemmed | Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography Devices |
| title_short | Analytical, Experimental, and Finite Element Study of Stress Concentration for Samples Printed on Masked Stereolithography Devices |
| title_sort | analytical experimental and finite element study of stress concentration for samples printed on masked stereolithography devices |
| topic | Masked Stereolithography (mSLA) additive manufacturing stress concentrators photosensitive resin DIC |
| url | https://www.mdpi.com/2673-3161/6/1/21 |
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