Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass
Fused silica glass, known for its exceptional physical and chemical properties, is widely used across diverse industries. Cerium oxide (CeO2), a common polishing abrasive, is extensively employed in polishing fused silica surfaces. Studies have revealed that chemical reactions occur on fused silica...
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| Language: | English |
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Elsevier
2025-01-01
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| Series: | Journal of Materials Research and Technology |
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| Online Access: | http://www.sciencedirect.com/science/article/pii/S223878542402859X |
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| author | Xiaolong Ke Wei Wu Bo Zhong Tianyi Wang Song Yuan Zhenzhong Wang Daewook Kim Jianchun Liu Min Li Jiang Guo Chunjin Wang |
| author_facet | Xiaolong Ke Wei Wu Bo Zhong Tianyi Wang Song Yuan Zhenzhong Wang Daewook Kim Jianchun Liu Min Li Jiang Guo Chunjin Wang |
| author_sort | Xiaolong Ke |
| collection | DOAJ |
| description | Fused silica glass, known for its exceptional physical and chemical properties, is widely used across diverse industries. Cerium oxide (CeO2), a common polishing abrasive, is extensively employed in polishing fused silica surfaces. Studies have revealed that chemical reactions occur on fused silica surfaces during polishing processes with CeO2 abrasives. While these chemical reactions have been studied in the context of chemical-mechanical polishing on fused silica surfaces, the chemical impacts of employing a small, compliant polishing tool on fused silica surfaces remain unclear. In this study, we use CeO2 abrasive and alumina (Al2O3) abrasive as polishing slurries and utilize a bonnet tool to polish fused silica surfaces. Through a comparative analysis of the removal efficiency of the tool influence function, alterations in surface hardness, and the sub-surface damage layer, we found that the primary factor governing material removal is the chemical reactions between CeO2 and fused silica. These reactions effectively soften the fused silica molecule layers and contribute to rapid material removal. This research fills the knowledge gap regarding the chemical effects during bonnet polishing with CeO2 abrasive. It offers valuable insights for efficient material removal control in the context of bonnet polishing fused silica surfaces. These insights will also be applicable to other computer-controlled polishing processes for fused silica glass utilizing CeO2 slurry. |
| format | Article |
| id | doaj-art-c049bac35a5f44978545e5b1b5e312f9 |
| institution | Kabale University |
| issn | 2238-7854 |
| language | English |
| publishDate | 2025-01-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Journal of Materials Research and Technology |
| spelling | doaj-art-c049bac35a5f44978545e5b1b5e312f92025-01-19T06:25:13ZengElsevierJournal of Materials Research and Technology2238-78542025-01-0134249258Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glassXiaolong Ke0Wei Wu1Bo Zhong2Tianyi Wang3Song Yuan4Zhenzhong Wang5Daewook Kim6Jianchun Liu7Min Li8Jiang Guo9Chunjin Wang10School of Mechanical and Automotive Engineering, Xiamen University of Technology, Xiamen, 361024, China; Xiamen Key Laboratory of Robot Systems and Digital Manufacturing, Xiamen University of Technology, Xiamen, 361024, ChinaState Key Laboratory of Ultra-precision Machining Technology, Hong Kong Polytechnic University, Hong Kong, ChinaDepartment of Automation, Tsinghua University, Beijing, 100084, China; Corresponding author.National Synchrotron Light Source II (NSLS-II), Brookhaven National Laboratory, PO Box 5000, Upton, NY, 11973, USAState Key Laboratory of Ultra-precision Machining Technology, Hong Kong Polytechnic University, Hong Kong, ChinaSchool of Aeronautics and Astronautics, Xiamen University, Xiamen, 361005, ChinaWyant College of Optical Sciences, University of Arizona, Tucson, AZ, 85721, USASchool of Mechanical and Automotive Engineering, Xiamen University of Technology, Xiamen, 361024, China; Xiamen Key Laboratory of Robot Systems and Digital Manufacturing, Xiamen University of Technology, Xiamen, 361024, ChinaSchool of Mechanical Engineering, Hefei University of Technology, Hefei, 230009, ChinaState Key Laboratory of High-performance Precision Manufacturing, Dalian University of Technology, Dalian, 116024, ChinaState Key Laboratory of Ultra-precision Machining Technology, Hong Kong Polytechnic University, Hong Kong, China; Corresponding author.Fused silica glass, known for its exceptional physical and chemical properties, is widely used across diverse industries. Cerium oxide (CeO2), a common polishing abrasive, is extensively employed in polishing fused silica surfaces. Studies have revealed that chemical reactions occur on fused silica surfaces during polishing processes with CeO2 abrasives. While these chemical reactions have been studied in the context of chemical-mechanical polishing on fused silica surfaces, the chemical impacts of employing a small, compliant polishing tool on fused silica surfaces remain unclear. In this study, we use CeO2 abrasive and alumina (Al2O3) abrasive as polishing slurries and utilize a bonnet tool to polish fused silica surfaces. Through a comparative analysis of the removal efficiency of the tool influence function, alterations in surface hardness, and the sub-surface damage layer, we found that the primary factor governing material removal is the chemical reactions between CeO2 and fused silica. These reactions effectively soften the fused silica molecule layers and contribute to rapid material removal. This research fills the knowledge gap regarding the chemical effects during bonnet polishing with CeO2 abrasive. It offers valuable insights for efficient material removal control in the context of bonnet polishing fused silica surfaces. These insights will also be applicable to other computer-controlled polishing processes for fused silica glass utilizing CeO2 slurry.http://www.sciencedirect.com/science/article/pii/S223878542402859XBonnet polishingCerium oxideFused silicaChemical effectUltra-precision machining |
| spellingShingle | Xiaolong Ke Wei Wu Bo Zhong Tianyi Wang Song Yuan Zhenzhong Wang Daewook Kim Jianchun Liu Min Li Jiang Guo Chunjin Wang Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass Journal of Materials Research and Technology Bonnet polishing Cerium oxide Fused silica Chemical effect Ultra-precision machining |
| title | Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass |
| title_full | Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass |
| title_fullStr | Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass |
| title_full_unstemmed | Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass |
| title_short | Systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass |
| title_sort | systematic analysis on the chemical reaction to the material removal in bonnet polishing of fused silica glass |
| topic | Bonnet polishing Cerium oxide Fused silica Chemical effect Ultra-precision machining |
| url | http://www.sciencedirect.com/science/article/pii/S223878542402859X |
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