Hafnium oxide—A promising addition to the zoo of passivation layers for silicon solar cells?
Hafnium oxide (HfO2) has been known for a long time as a high-κ dielectric in silicon microelectronics. Recently, it has found its way into silicon photovoltaics, where it is applied as the surface-passivating dielectric. In this study, we examine the surface passivation quality of atomic-layer-depo...
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-06-01
|
| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0273888 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
