The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering

Abstract 2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolaye...

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Main Authors: Bo Zhang, Veronika Cicmancova, Benes Ludvik, Stanislav Slang, Petr Kutalek, Martin Motola, Tomas Wagner
Format: Article
Language:English
Published: Wiley-VCH 2022-12-01
Series:Advanced Materials Interfaces
Subjects:
Online Access:https://doi.org/10.1002/admi.202201790
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author Bo Zhang
Veronika Cicmancova
Benes Ludvik
Stanislav Slang
Petr Kutalek
Martin Motola
Tomas Wagner
author_facet Bo Zhang
Veronika Cicmancova
Benes Ludvik
Stanislav Slang
Petr Kutalek
Martin Motola
Tomas Wagner
author_sort Bo Zhang
collection DOAJ
description Abstract 2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolayers are only formed on a cooled substrate. Ag doping helps to exfoliate 2D WO3 into freestanding monolayers, in which the thickness of 2D monolayer is only ≈3 nm. The ultralarge size of 2D WO3 shows unique features from the traditional 2D material. Resistive switching device and photocatalysis are discussed as examples of application. There is a clear intermediate resistance state in the device with 2D structure. And the failure of resistive switching device is closely related with the 2D structure of WO3. In the application of photocatalysis, an improved two‐step exfoliation, achieving a stack of WO3 monolayers with a large internal volume, is utilized. The enhancements of photocatalysis are obtained with 2D WO3 after exfoliation.
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institution Kabale University
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series Advanced Materials Interfaces
spelling doaj-art-bf3f179510de4657bba6277776b3da1b2025-08-20T03:29:39ZengWiley-VCHAdvanced Materials Interfaces2196-73502022-12-01935n/an/a10.1002/admi.202201790The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron SputteringBo Zhang0Veronika Cicmancova1Benes Ludvik2Stanislav Slang3Petr Kutalek4Martin Motola5Tomas Wagner6College of Physics Hebei Normal University Shijiazhuang 050024 ChinaCenter of Materials and Nanotechnologies Faculty of Chemical Technology University of Pardubice Nam. Cs. Legii 565 Pardubice 530 02 Czech RepublicCenter of Materials and Nanotechnologies Faculty of Chemical Technology University of Pardubice Nam. Cs. Legii 565 Pardubice 530 02 Czech RepublicCenter of Materials and Nanotechnologies Faculty of Chemical Technology University of Pardubice Nam. Cs. Legii 565 Pardubice 530 02 Czech RepublicJoint Laboratory of Solid State Chemistry University of Pardubice Studentska 84 Pardubice 532 10 Czech RepublicDepartment of Inorganic Chemistry Faculty of Natural Sciences Comenius University in Bratislava Ilkovicova 6 – Mlynska dolina Bratislava 842 15 SlovakCenter of Materials and Nanotechnologies Faculty of Chemical Technology University of Pardubice Nam. Cs. Legii 565 Pardubice 530 02 Czech RepublicAbstract 2D oxide materials have gained tremendous attention in the applications. Herein, a synthesis route of 2D WO3 materials via magnetron sputtering is reported. A deposition between 2D monolayers and thin film structure are accomplished according to the temperature of substrate. And 2D monolayers are only formed on a cooled substrate. Ag doping helps to exfoliate 2D WO3 into freestanding monolayers, in which the thickness of 2D monolayer is only ≈3 nm. The ultralarge size of 2D WO3 shows unique features from the traditional 2D material. Resistive switching device and photocatalysis are discussed as examples of application. There is a clear intermediate resistance state in the device with 2D structure. And the failure of resistive switching device is closely related with the 2D structure of WO3. In the application of photocatalysis, an improved two‐step exfoliation, achieving a stack of WO3 monolayers with a large internal volume, is utilized. The enhancements of photocatalysis are obtained with 2D WO3 after exfoliation.https://doi.org/10.1002/admi.202201790magnetron sputteringmagnetron sputteringresistive random‐access memorytwo‐dimensional materials
spellingShingle Bo Zhang
Veronika Cicmancova
Benes Ludvik
Stanislav Slang
Petr Kutalek
Martin Motola
Tomas Wagner
The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering
Advanced Materials Interfaces
magnetron sputtering
magnetron sputtering
resistive random‐access memory
two‐dimensional materials
title The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering
title_full The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering
title_fullStr The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering
title_full_unstemmed The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering
title_short The Structural Modulation of Amorphous 2D Tungsten Oxide Materials in Magnetron Sputtering
title_sort structural modulation of amorphous 2d tungsten oxide materials in magnetron sputtering
topic magnetron sputtering
magnetron sputtering
resistive random‐access memory
two‐dimensional materials
url https://doi.org/10.1002/admi.202201790
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