Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen Probes

Abstract High‐frequency plasmaspheric hiss (HFPH) is considered to be excited by substorm‐injected electrons in a case study (He et al., 2019, https://doi.org/10.1029/2018gl081578). To better understand its generation, we performed a statistical study on this wave and electron distributions, based o...

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Main Authors: Qi Yan, Zhaoguo He, Jiang Yu, Xiangling Ding
Format: Article
Language:English
Published: Wiley 2025-04-01
Series:Geophysical Research Letters
Online Access:https://doi.org/10.1029/2024GL113866
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author Qi Yan
Zhaoguo He
Jiang Yu
Xiangling Ding
author_facet Qi Yan
Zhaoguo He
Jiang Yu
Xiangling Ding
author_sort Qi Yan
collection DOAJ
description Abstract High‐frequency plasmaspheric hiss (HFPH) is considered to be excited by substorm‐injected electrons in a case study (He et al., 2019, https://doi.org/10.1029/2018gl081578). To better understand its generation, we performed a statistical study on this wave and electron distributions, based on the Van Allen Probe data from 2012 to 2018. It shows HFPH cover a wide space from predawn to dusk side during active substorms (AE∗≥300 nT), with large amplitudes (>20 pT) at 3<L<5. Simultaneously, injected electrons are enhanced in the energy range from ∼500 eV to tens keV. Calculated linear wave growth rates driven by the injected electrons suggest HFPH is more effectively excited at dawnside, consistent with observations. Besides, the effective energy band of the electrons related to a wave decreases as L shell increases and the higher frequency wave is excited over lower L shells. Those explain HFPH spatial distributions and provide new insights into contribution of substorm‐injected electrons to HFPH generation.
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spelling doaj-art-bdf6acf57d65452bbd833c2ac94bd6012025-08-20T03:44:25ZengWileyGeophysical Research Letters0094-82761944-80072025-04-01528n/an/a10.1029/2024GL113866Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen ProbesQi Yan0Zhaoguo He1Jiang Yu2Xiangling Ding3State Key Laboratory of Solar Activity and Space Weather National Space Science Center Chinese Academy of Sciences Beijing ChinaState Key Laboratory of Lunar and Planetary Sciences Macau University of Science and Technology Macao ChinaSchool of Atmospheric Science Sun Yat‐Sen University Zhuhai ChinaSchool of Atmospheric Science Sun Yat‐Sen University Zhuhai ChinaAbstract High‐frequency plasmaspheric hiss (HFPH) is considered to be excited by substorm‐injected electrons in a case study (He et al., 2019, https://doi.org/10.1029/2018gl081578). To better understand its generation, we performed a statistical study on this wave and electron distributions, based on the Van Allen Probe data from 2012 to 2018. It shows HFPH cover a wide space from predawn to dusk side during active substorms (AE∗≥300 nT), with large amplitudes (>20 pT) at 3<L<5. Simultaneously, injected electrons are enhanced in the energy range from ∼500 eV to tens keV. Calculated linear wave growth rates driven by the injected electrons suggest HFPH is more effectively excited at dawnside, consistent with observations. Besides, the effective energy band of the electrons related to a wave decreases as L shell increases and the higher frequency wave is excited over lower L shells. Those explain HFPH spatial distributions and provide new insights into contribution of substorm‐injected electrons to HFPH generation.https://doi.org/10.1029/2024GL113866
spellingShingle Qi Yan
Zhaoguo He
Jiang Yu
Xiangling Ding
Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen Probes
Geophysical Research Letters
title Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen Probes
title_full Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen Probes
title_fullStr Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen Probes
title_full_unstemmed Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen Probes
title_short Contribution of Substorm‐Injected Electrons to the High‐Frequency Plasmaspheric Hiss Generation: A Statistical Study by Van Allen Probes
title_sort contribution of substorm injected electrons to the high frequency plasmaspheric hiss generation a statistical study by van allen probes
url https://doi.org/10.1029/2024GL113866
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AT jiangyu contributionofsubstorminjectedelectronstothehighfrequencyplasmaspherichissgenerationastatisticalstudybyvanallenprobes
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