Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar Plasma
Peculiarities of depth profiling of PbTe crystals by Ar plasma with energy of 350 eV at the conditions of Secondary Neutral Mass Spectrometry originated from the crystal growth environment are presented. The crystals grown from vapor phase and from melt by the Bridgman method were studied. The natur...
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Sumy State University
2017-10-01
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| Series: | Журнал нано- та електронної фізики |
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| Online Access: | http://jnep.sumdu.edu.ua:8080/download/numbers/2017/5/articles/Proof_JNEP_05034.pdf |
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| author | D.M. Zayachuk V.E. Slynko A. Csik |
| author_facet | D.M. Zayachuk V.E. Slynko A. Csik |
| author_sort | D.M. Zayachuk |
| collection | DOAJ |
| description | Peculiarities of depth profiling of PbTe crystals by Ar plasma with energy of 350 eV at the conditions of Secondary Neutral Mass Spectrometry originated from the crystal growth environment are presented. The crystals grown from vapor phase and from melt by the Bridgman method were studied. The natural faceted surface corresponding to the crystallographic plane of high symmetry (100), the natural lateral surfaces of crystal ingots, and the surfaces processed mechanically during cutting of the crystals were profiled. Nucleation, growth, and re-sputtering of the arrays of micro- and nanoscopic surface structures on the sputtered surfaces as a result of re-deposition of sputtered Pb and Te atoms were observed. It was determined that the growth environment of the PbTe crystal surfaces has a strong effect on nucleation and growth of the surface micro- and nanostructures in the conditions of continuous surface bombardment by Ar ions during depth profiling. This does not prevent the correct determination of the composition of the studied objects via the analysis of the composition of sputtered phase, if sputtering continues for at least 5-10 minutes. |
| format | Article |
| id | doaj-art-bd9b1fbf3ccb46f1a82f1266b6c2e41d |
| institution | OA Journals |
| issn | 2077-6772 |
| language | English |
| publishDate | 2017-10-01 |
| publisher | Sumy State University |
| record_format | Article |
| series | Журнал нано- та електронної фізики |
| spelling | doaj-art-bd9b1fbf3ccb46f1a82f1266b6c2e41d2025-08-20T02:19:11ZengSumy State UniversityЖурнал нано- та електронної фізики2077-67722017-10-019505034-105034-710.21272/jnep.9(5).05034Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar PlasmaD.M. Zayachuk01V.E. Slynko2A. Csik3Lviv Polytechnic National University, 12, S. Bandera Str., 79013 Lviv, UkraineLviv Polytechnic National University, 12, S. Bandera Str., 79013 Lviv, UkraineInstitute for Problems of Material Science NASU, Chernivtsy Branch, 5, Vilde Str., 58001 Chernivtsi, UkraineInstitute for Nuclear Research, Hungarian Academy of Sciences (ATOMKI), H-4026 Debrecen, Bem ter 18/c, HungaryPeculiarities of depth profiling of PbTe crystals by Ar plasma with energy of 350 eV at the conditions of Secondary Neutral Mass Spectrometry originated from the crystal growth environment are presented. The crystals grown from vapor phase and from melt by the Bridgman method were studied. The natural faceted surface corresponding to the crystallographic plane of high symmetry (100), the natural lateral surfaces of crystal ingots, and the surfaces processed mechanically during cutting of the crystals were profiled. Nucleation, growth, and re-sputtering of the arrays of micro- and nanoscopic surface structures on the sputtered surfaces as a result of re-deposition of sputtered Pb and Te atoms were observed. It was determined that the growth environment of the PbTe crystal surfaces has a strong effect on nucleation and growth of the surface micro- and nanostructures in the conditions of continuous surface bombardment by Ar ions during depth profiling. This does not prevent the correct determination of the composition of the studied objects via the analysis of the composition of sputtered phase, if sputtering continues for at least 5-10 minutes.http://jnep.sumdu.edu.ua:8080/download/numbers/2017/5/articles/Proof_JNEP_05034.pdfSecondary Neutral Mass SpectrometryDepth ProfilingPbTeSputteringRe-deposition |
| spellingShingle | D.M. Zayachuk V.E. Slynko A. Csik Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar Plasma Журнал нано- та електронної фізики Secondary Neutral Mass Spectrometry Depth Profiling PbTe Sputtering Re-deposition |
| title | Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar Plasma |
| title_full | Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar Plasma |
| title_fullStr | Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar Plasma |
| title_full_unstemmed | Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar Plasma |
| title_short | Growth of Surface Micro- and Nanostructures During Depth Profiling of PbTe Crystals by Ar Plasma |
| title_sort | growth of surface micro and nanostructures during depth profiling of pbte crystals by ar plasma |
| topic | Secondary Neutral Mass Spectrometry Depth Profiling PbTe Sputtering Re-deposition |
| url | http://jnep.sumdu.edu.ua:8080/download/numbers/2017/5/articles/Proof_JNEP_05034.pdf |
| work_keys_str_mv | AT dmzayachuk growthofsurfacemicroandnanostructuresduringdepthprofilingofpbtecrystalsbyarplasma AT veslynko growthofsurfacemicroandnanostructuresduringdepthprofilingofpbtecrystalsbyarplasma AT acsik growthofsurfacemicroandnanostructuresduringdepthprofilingofpbtecrystalsbyarplasma |