Growth and characterization of aluminum nitride (AlN) thin film on steel using reactive sputtering deposition
In this study, aluminum nitrid (AlN) thin films were deposited on steel using reactive sputtering physical vapour deposition (PVD). The aim was to develop an AlN-coated steel surface and assess its tribological and mechanical behavior. X-ray diffraction results confirmed the formation of the AlN thi...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2025-01-01
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| Series: | Materials Research Express |
| Subjects: | |
| Online Access: | https://doi.org/10.1088/2053-1591/adec43 |
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| Summary: | In this study, aluminum nitrid (AlN) thin films were deposited on steel using reactive sputtering physical vapour deposition (PVD). The aim was to develop an AlN-coated steel surface and assess its tribological and mechanical behavior. X-ray diffraction results confirmed the formation of the AlN thin film, which had a thickness ranging from 0.5 to 1.1 μm, as measured by scanning electron microscopy. The morphology of the AlN film exhibited a nano-crystalline structure. The roughness of the thin film was measured at 96.377 nm, while the grain size ranged from 0.073 to 0.213 μm, as determined by atomic force microscopy (AFM). Additionally, the thin film displayed excellent resistance to wear and improved surface hardness. |
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| ISSN: | 2053-1591 |