A CMOS Compatible Ultracompact Silicon Photonic Optical Add-Drop Multiplexer with Misaligned Sidewall Bragg Gratings
We experimentally and via simulations demonstrate ultracompact single-stage and cascaded optical add-drop multiplexers using misaligned sidewall Bragg grating in a Mach–Zehnder interferometer for the silicon-on-insulator platform. The single-stage configuration has a device footprint of 4...
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| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2017-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/7927392/ |
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| Summary: | We experimentally and via simulations demonstrate ultracompact single-stage and cascaded optical add-drop multiplexers using misaligned sidewall Bragg grating in a Mach–Zehnder interferometer for the silicon-on-insulator platform. The single-stage configuration has a device footprint of 400 <inline-formula> <tex-math notation="LaTeX">${\mu }\text{m}\,\times$</tex-math></inline-formula> 90 <inline-formula> <tex-math notation="LaTeX">${\mu }\text{m}$</tex-math></inline-formula>, and the cascaded configuration has a footprint of 400 <inline-formula><tex-math notation="LaTeX">${\mu }\text{m}\,\times$</tex-math></inline-formula>  125 <inline-formula><tex-math notation="LaTeX">${\mu }\text{m}$</tex-math></inline-formula>. The proposed designs have 3-dB bandwidths of 6 nm and extinction ratios of 25 dB and 51 dB, respectively, and have been fabricated for the transverse electric mode. A minimum lithographic feature size of 80 nm is used in our design, which is within the limitation of 193 nm deep ultraviolet lithography. |
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| ISSN: | 1943-0655 |