Purity of Ion Beams: Analysis and Simulation of Mass Spectra and Mass Interferences in Ion Implantation
This paper shows that charge exchange events and dissociation reactions of ions may impact the purity of the ion beam in ion implantation, leading to contamination of the implanted target. Physical relations are derived that explain why unwanted ions are transported in the ion beam despite of a magn...
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Main Authors: | Volker Häublein, Heiner Ryssel, Lothar Frey |
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Format: | Article |
Language: | English |
Published: |
Wiley
2012-01-01
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Series: | Advances in Materials Science and Engineering |
Online Access: | http://dx.doi.org/10.1155/2012/610150 |
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