EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON

ZnSe epitaxial films are grown on (111)- and (100)-oriented Si substrates with a porous buffer layer by the thermal evaporation of ZnSe compound. The crystal structure of the deposited films was controlled by X-ray diffraction. The morphology of the films was studied by high-resolution scanning elec...

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Main Authors: V. I. Levchenko, L. I. Postnova, E. L. Trukhanava, V. P. Bondarenko
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
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Online Access:https://doklady.bsuir.by/jour/article/view/559
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author V. I. Levchenko
L. I. Postnova
E. L. Trukhanava
V. P. Bondarenko
author_facet V. I. Levchenko
L. I. Postnova
E. L. Trukhanava
V. P. Bondarenko
author_sort V. I. Levchenko
collection DOAJ
description ZnSe epitaxial films are grown on (111)- and (100)-oriented Si substrates with a porous buffer layer by the thermal evaporation of ZnSe compound. The crystal structure of the deposited films was controlled by X-ray diffraction. The morphology of the films was studied by high-resolution scanning electron microscopy. It was demonstrated the porous buffer layer provides improving the quality of the films compared with films deposited on the monolithic silicon.
format Article
id doaj-art-b7105b122d774bccac0f4a1f59682ecd
institution Kabale University
issn 1729-7648
language Russian
publishDate 2019-06-01
publisher Educational institution «Belarusian State University of Informatics and Radioelectronics»
record_format Article
series Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
spelling doaj-art-b7105b122d774bccac0f4a1f59682ecd2025-08-20T03:37:56ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-0106100102558EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICONV. I. Levchenko0L. I. Postnova1E. L. Trukhanava2V. P. Bondarenko3ГО «НПЦ НАН Беларуси по материаловедению»ГО «НПЦ НАН Беларуси по материаловедению»ГО «НПЦ НАН Беларуси по материаловедению»Белорусский государственный университет информатики и радиоэлектроникиZnSe epitaxial films are grown on (111)- and (100)-oriented Si substrates with a porous buffer layer by the thermal evaporation of ZnSe compound. The crystal structure of the deposited films was controlled by X-ray diffraction. The morphology of the films was studied by high-resolution scanning electron microscopy. It was demonstrated the porous buffer layer provides improving the quality of the films compared with films deposited on the monolithic silicon.https://doklady.bsuir.by/jour/article/view/559эпитаксиальные пленкиселенид цинкапористый кремний
spellingShingle V. I. Levchenko
L. I. Postnova
E. L. Trukhanava
V. P. Bondarenko
EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
эпитаксиальные пленки
селенид цинка
пористый кремний
title EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON
title_full EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON
title_fullStr EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON
title_full_unstemmed EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON
title_short EPITAXIAL FILMS OF ZINC SELENIDE ON POROUS SILICON
title_sort epitaxial films of zinc selenide on porous silicon
topic эпитаксиальные пленки
селенид цинка
пористый кремний
url https://doklady.bsuir.by/jour/article/view/559
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AT lipostnova epitaxialfilmsofzincselenideonporoussilicon
AT eltrukhanava epitaxialfilmsofzincselenideonporoussilicon
AT vpbondarenko epitaxialfilmsofzincselenideonporoussilicon